Jump to content

Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Ti etch: Difference between revisions

← Older edit
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,301 edits
No edit summary
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,301 edits
No edit summary
 
(One intermediate revision by the same user not shown)
Line 37: Line 37:
!style="background:silver; color:black" align="left" valign="top"|Etch depth
!style="background:silver; color:black" align="left" valign="top"|Etch depth
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*300nm
*300nnm
|
|
*~270 nm
*~270 nm
Line 45: Line 45:
*>80 nm/min
*>80 nm/min
|
|
*22 nm/min +- 0.3nm/min (one standard deviation)
*22 nm/min +- 0.3nnm/min (one standard deviation)
|-
|-
!style="background:silver; color:black" align="left" valign="top"|Etch rate uniformity
!style="background:silver; color:black" align="left" valign="top"|Etch rate uniformity
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<+-2%
*<&plusmn;2%
|
|
*+-(0.2% +-0.2%)
*&plusmn;(0.2% &plusmn;0.2%)
|-
|-
!style="background:silver; color:black" align="left" valign="top"|Reproducibility
!style="background:silver; color:black" align="left" valign="top"|Reproducibility
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<+-2%
*<&plusmn;2%
|
|
*+-(0.8% +-0.5%)
*&plusmn;(0.8% &plusmn;0.5%)
|-
|-
!style="background:silver; color:black" align="left" valign="top"|Selectivity (Ti etch rate/ZEP etch rate)
!style="background:silver; color:black" align="left" valign="top"|Selectivity (Ti etch rate/ZEP etch rate)
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/IBE_Ti_etch"