Specific Process Knowledge/Pattern Design/Travka/fields/Tridge: Difference between revisions
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== The T-ridge field == | == The T-ridge field == | ||
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The T-ridge fields contain a triple ridge structure for a number of different ridge widths. The triple ridge structure is shown in the image. [[Image:T-ridge2.jpg |500x500px|thumb|Definition of the measures used in the table below]] It consists of three ridges of a certain width. The two trenches between them have the same width. The three ridges are separated by an etched area that is five times the ridge width. This parameters of this feature is not changed in the different Travka masks. In order to vary the exposed area on each Travka mask a masked area (in the figure called 'space') is added between every feature. | The T-ridge fields contain a triple ridge structure for a number of different ridge widths. The triple ridge structure is shown in the image. [[Image:T-ridge2.jpg |500x500px|thumb|Definition of the measures used in the table below]] It consists of three ridges of a certain width. The two trenches between them have the same width. The three ridges are separated by an etched area that is five times the ridge width. This parameters of this feature is not changed in the different Travka masks. In order to vary the exposed area on each Travka mask a masked area (in the figure called 'space') is added between every feature. | ||