Specific Process Knowledge/Etch/OES: Difference between revisions
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=Optical endpoint detection on the dry etch tools at DTU Nanolab= | =Optical endpoint detection on the dry etch tools at DTU Nanolab= | ||
Several dry etch tools at DTU Nanolab are equipped with an endpoint detection system. Out of those systems only one is not of the type optical endpoint detection. The instruments are: | Several dry etch tools at DTU Nanolab are equipped with an endpoint detection system. Out of those systems only one is not of the type optical endpoint detection. The instruments are: | ||
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* III-V ICP | * III-V ICP | ||
* Pegasus 1 | * Pegasus 1 | ||
* Pegasus 2 | |||
* Pegasus 4 | * Pegasus 4 | ||
The section below describes the principle behind the optical endpoint detection system. | The section below describes the principle behind the optical endpoint detection system. | ||
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| align="center" style="background:#f0f0f0;"|'''Monitored species''' | | align="center" style="background:#f0f0f0;"|'''Monitored species''' | ||
| align="center" style="background:#f0f0f0;" width="120px"|'''Wavelength (nm)''' | | align="center" style="background:#f0f0f0;" width="120px"|'''Wavelength (nm)''' | ||
| | | width="20"| | ||
| align="center" style="background:#f0f0f0;"|'''Monitored species''' | | align="center" style="background:#f0f0f0;"|'''Monitored species''' | ||
| align="center" style="background:#f0f0f0;" width="120px"|'''Wavelength (nm)''' | | align="center" style="background:#f0f0f0;" width="120px"|'''Wavelength (nm)''' | ||
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## The process pressure | ## The process pressure | ||
# Etch product: | # Etch product: | ||