Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres: Difference between revisions
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== Selecting high resolution spectra for peak fitting == | == Selecting high resolution spectra for peak fitting == | ||
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The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. | The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. | ||
The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|here]]</span>. | The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|'''here''']]</span>. | ||