Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres: Difference between revisions
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== Selecting high resolution spectra for peak fitting == | == Selecting high resolution spectra for peak fitting == | ||
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The analysis of the data from [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/1intro#anchor_1introbottom|here]] is continued. | The analysis of the data from [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/1intro#anchor_1introbottom|here]] is continued. | ||
Open a new data grid and drag the four sets of spectra into each quadrant as seen below. | Open a new data grid and drag the four sets of spectra into each quadrant as seen below. From these four sets of spectra a peak table will be made from which the quantification calculated. Each data grid contains a peak table and it is therefore essential that the peak table obtained from the survey spectra does not get mixed with the one from the high resolution spectra. | ||
[[File:XPS-basics10.jpg|700px]] | [[File:XPS-basics10.jpg|700px]] | ||
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# Right click inside the table and select 'Propagate Selected Constraints/Values..' as shown below. | # Right click inside the table and select 'Propagate Selected Constraints/Values..' as shown below. | ||
# Select 'All Columns' and 'Constraints and Values' | # Select 'All Columns' and 'Constraints and Values' | ||
[[File:XPS-basics19a1.jpg|500px]] | |||
[[File:XPS-basics19b.jpg|300px]] | |||
Before applying the constraints to the fitting of all the levels, it may be a good idea to rename the peaks. Here, it makes good sense to apply the names 'Bulk' and 'Oxide'. | |||
[[File:Si2p fit1.jpg|500px]] | |||
Then, | |||
# Click the 'Peak Fitting' button, select 'Fit All Levels' in the 'Fit Peaks'. | # Click the 'Peak Fitting' button, select 'Fit All Levels' in the 'Fit Peaks'. | ||
# Click 'Accept' when the fitting routine has completed. | # Click 'Accept' when the fitting routine has completed. | ||
The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. | |||
The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top|'''here''']]</span>. | |||