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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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<!--Checked for updates on 11/2-2019 - ok/jmli -->
<!--Page reviewed by jmli 9/8-2022 -->
<!--Page reviewed by jmli 28/4-2023  -->
{{Author-jmli1}}
<!--Checked for updates on 4/9-2025 - ok/jmli -->
 
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|+ '''Process runs'''
Line 23: Line 28:
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean
| 10 minute TDESC clean
| danchip/jml/showerhead/prD, 110 cycles or 8:04 minutes  
| nanolab/jml/showerhead/prD, 110 cycles or 8:04 minutes  
| S004584
| S004584
! Old showerhead  
! Old showerhead  
Line 37: Line 42:
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| 10 minute TDESC clean + 45 sec barc etch
| danchip/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| nanolab/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| S004675
| S004675
! New showerhead  
! New showerhead  
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