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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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<!--Checked for updates on 11/2-2019 - ok/jmli -->
<!--Checked for updates on 11/2-2019 - ok/jmli -->
   
<!--Page reviewed by jmli 9/8-2022 -->
<!--Checked for updates on 4/9-2025 - ok/jmli -->
{{Author-jmli1}}
 
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|+ '''Process runs'''
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|-
|-
| 18/8-2014
| 18/8-2014
| 4" Danchip QC Wafer  
| 4" Nanolab QC Wafer  
| 1.5 µm AZ resist, daq2 mask
| 1.5 µm AZ resist, daq2 mask
| Si / 10 %  
| Si / 10 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean, 10 minute PR strip post process
| 10 minute TDESC clean, 10 minute PR strip post process
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| S004257
| S004257
! OLD showerhead  
! OLD showerhead  
Line 37: Line 40:
|-
|-
| 20/11-2014
| 20/11-2014
| 4" Danchip QC Wafer  
| 4" Nanolab QC Wafer  
| 1.5 µm AZ resist, daq2 mask
| 1.5 µm AZ resist, daq2 mask
| Si / 10 %  
| Si / 10 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean, 10 minute PR strip post process
| 10 minute TDESC clean, 10 minute PR strip post process
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| S004580
| S004580
! OLD showerhead  
! OLD showerhead  
Line 52: Line 55:
|-
|-
| 1/12-2014
| 1/12-2014
| 4" Danchip QC Wafer  
| 4" Nanolab QC Wafer  
| 1.5 µm AZ resist, daq2 mask
| 1.5 µm AZ resist, daq2 mask
| Si / 10 %  
| Si / 10 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean, 10 minute PR strip post process
| 10 minute TDESC clean, 10 minute PR strip post process
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| S004671
| S004671
! New showerhead  
! New showerhead  
Line 68: Line 71:
|-
|-
| 15/12-2014
| 15/12-2014
| 4" Danchip QC Wafer  
| 4" Nanolab QC Wafer  
| 1.5 µm AZ resist, daq2 mask
| 1.5 µm AZ resist, daq2 mask
| Si / 10 %  
| Si / 10 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean, 10 minute PR strip post process
| 10 minute TDESC clean, 10 minute PR strip post process
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| S004746
| S004746
! New showerhead  
! New showerhead  
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