Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly4: Difference between revisions
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{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" | {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" | ||
|+ '''Process runs''' | |+ '''Process runs''' | ||
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| Pegasus/jmli | | Pegasus/jmli | ||
| 10 minute TDESC clean + 45 sec barc etch | | 10 minute TDESC clean + 45 sec barc etch | ||
| | | nanolab/jml/showerhead/Cpoly4, 20 cycles or 2:16 minutes | ||
| S004733 | | S004733 | ||
| New showerhead | | New showerhead | ||