Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly5: Difference between revisions

← Older edit
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
No edit summary
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
No edit summary
 
(4 intermediate revisions by the same user not shown)
Line 1: Line 1:
   
<!--Checked for updates on 11/2-2019 - ok/jmli -->
<!--Page reviewed by jmli 9/8-2022 -->
<!--Checked for updates on 6/2-2013 - ok/jmli -->
{{Template:Author-jmli1}}
<!--Checked for updates on 4/9-2025 - ok/jmli -->
 
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|+ '''Process runs'''
Line 23: Line 28:
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| 10 minute TDESC clean + 45 sec barc etch
| danchip/jml/showerhead/Cpoly5, 20 cycles or 2:20 minutes  
| nanolab/jml/showerhead/Cpoly5, 20 cycles or 2:20 minutes  
| S004734
| S004734
| New showerhead  
| New showerhead  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly5"