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| | '''Feedback to this page: |
| | [mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/StandardRecipes click here]''' |
| | <!--Checked for updates on 30/7-2018 - ok/jmli --> |
| | <!--Checked for updates on 5/10-2020 - ok/jmli --> |
| | <!--Checked for updates on 4/9-2025 - ok/jmli --> |
| | |
| == Overview of the standard processes: Processes A, B, C, D and SOI == | | == Overview of the standard processes: Processes A, B, C, D and SOI == |
| | <!--Page reviewed by jmli 2/2-2023 --> |
| | {{Template:Author-jmli1}} |
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| The instrument was accepted on the basis of the performance of 5 processes. Below is a general comparison - to find more detailed information, go the web page for each process | | The instrument was accepted on the basis of the performance of 5 processes. Below is a general comparison - to find more detailed information, go the web page for each process |
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| |- | | |- |
| |} | | ! [[Specific Process Knowledge/Etch/DRIE-Pegasus/processC|Process C]] |
| | | | Continuous |
| | | | Very slow etch |
| | | | 50 nm posts |
| | | | Aluminum |
| | | | 99.9 % on 4" wafer |
| {| border="2" cellspacing="0" cellpadding="2"
| | | |
| | | | |
| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
| |
| |style="background:WhiteSmoke; color:black"|<b>Equipment 1</b> | |
| |style="background:WhiteSmoke; color:black"|<b>Equipment 2</b> | |
| |- | | |- |
| !style="background:silver; color:black;" align="center"|Purpose | | ! [[Specific Process Knowledge/Etch/DRIE-Pegasus/processD|Process D]] |
| |style="background:LightGrey; color:black"|
| | | Bosch |
| |style="background:WhiteSmoke; color:black"|
| | | Smooth sidewall etch |
| *Purpose 1
| | | 10 µm trench |
| *Purpose 2
| | | Photo resist |
| |style="background:WhiteSmoke; color:black"|
| | | 50 % on 6" wafer |
| *Purpose 1
| | | |
| *Purpose 2
| | | |
| *Purpose 3
| |
| |-
| |
| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
| |
| |style="background:LightGrey; color:black"|Response 1
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *Performance range 1
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| *Performance range 2
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *Performance range 1
| |
| *Performance range 2
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| *Performance range 3
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| |-
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| |style="background:LightGrey; color:black"|Response 2
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *Performance range
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *Performance range
| |
| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
| |
| |style="background:LightGrey; color:black"|Parameter 1 | |
| |style="background:WhiteSmoke; color:black"| | |
| *Range
| |
| |style="background:WhiteSmoke; color:black"| | |
| *Range
| |
| |- | |
| |style="background:LightGrey; color:black"|Parameter 2 | |
| |style="background:WhiteSmoke; color:black"|
| |
| *Range
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *Range
| |
| |- | |
| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
| |
| |style="background:LightGrey; color:black"|Batch size
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *<nowiki>#</nowiki> small samples
| |
| *<nowiki>#</nowiki> 50 mm wafers
| |
| *<nowiki>#</nowiki> 100 mm wafers
| |
| *<nowiki>#</nowiki> 150 mm wafers
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *<nowiki>#</nowiki> small samples
| |
| *<nowiki>#</nowiki> 50 mm wafers
| |
| *<nowiki>#</nowiki> 100 mm wafers
| |
| *<nowiki>#</nowiki> 150 mm wafers
| |
| |- | | |- |
| | style="background:LightGrey; color:black"|Allowed materials
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *Allowed material 1
| |
| *Allowed material 2
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *Allowed material 1
| |
| *Allowed material 2
| |
| *Allowed material 3
| |
| |-
| |
| |} | | |} |
