Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano: Difference between revisions
No edit summary |
|||
| (5 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon/nano click here]''' | |||
<!--Checked for updates on 30/7-2018 - ok/jmli --> | |||
<!--Checked for updates on 5/10-2020 - ok/jmli --> | |||
<!--Checked for updates on 4/9-2025 - ok/jmli --> | |||
== Etching of nanostructures in silicon == | == Etching of nanostructures in silicon == | ||
{{Template:Author-jmli1}} | |||
<!--Checked for updates on 2/02-2023 - ok/jmli --> | |||
A series of experiments with etching nanostructures in silicon has been carried out. The common process parameters are: | A series of experiments with etching nanostructures in silicon has been carried out. The common process parameters are: | ||