Jump to content

Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano: Difference between revisions

← Older edit
VisualWikitext
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
No edit summary
 
(11 intermediate revisions by 2 users not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon/nano click here]'''
<!--Checked for updates on 30/7-2018 - ok/jmli -->
<!--Checked for updates on 5/10-2020 - ok/jmli -->
<!--Checked for updates on 4/9-2025 - ok/jmli -->
== Etching of nanostructures in silicon ==
== Etching of nanostructures in silicon ==
{{Template:Author-jmli1}}
<!--Checked for updates on 2/02-2023 - ok/jmli -->


A series of experiments with etching nanostructures in silicon has been carried out. The common process parameters are:
A series of experiments with etching nanostructures in silicon has been carried out. The common process parameters are:
Line 25: Line 32:
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinano4|4.0]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinano4|4.0]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinano35|3.5]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinano35|3.5]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano36|3.6]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinano36|3.6]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33-2|3.3]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan33-2|3.3]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan37|3.7]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan37|3.7]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan331|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331-2|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan331-2|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan332|3.32]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan332|3.32]]
|-
|-
!Cl<sub>2</sub> (sccm)
!Cl<sub>2</sub> (sccm)
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon/nano"