Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12: Difference between revisions

← Older edit
VisualWikitext
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
No edit summary
 
(8 intermediate revisions by 2 users not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 click here]'''
<!--Checked for updates on 30/7-2018 - ok/jmli -->
<!--Checked for updates on 5/10-2020 - ok/jmli -->
<!--Checked for updates on 4/9-2025 - ok/jmli -->
== The nano1.2 recipe ==
== The nano1.2 recipe ==
{{Template:Author-jmli1}}
<!--Checked for updates on 2/02-2023 - ok/jmli -->


{| border="2" cellpadding="2" cellspacing="1"  
{| border="2" cellpadding="2" cellspacing="1"  
Line 31: Line 37:
|-
|-
| Mask
| Mask
| 1dfhj10 nm zep etched down to 6dgh4 nm
| 343 nm zep etched down to 154 nm
|-  
|-  
|}
|}
Line 45: Line 51:
</gallery>
</gallery>


{| {{table}}
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''30'''
| align="center" style="background:#f0f0f0;"|'''60'''
| align="center" style="background:#f0f0f0;"|'''90'''
| align="center" style="background:#f0f0f0;"|'''120'''
| align="center" style="background:#f0f0f0;"|'''150'''
| align="center" style="background:#f0f0f0;"|'''Avg'''
| align="center" style="background:#f0f0f0;"|'''Std'''
|-
| Etch rates||nm/min||241||285||307||325||335||299||37
|-
| Sidewall angle ||degs||92||92||92||91||91||92||0
|-
| CD loss ||nm/edge||-5||-8||-18||-18||-34||-17||11
|-
| CD loss foot||nm/edge||-5||-8||-18||-18||-4||-10||7
|-
| Bowing||||19||11||11||14||10||13||4
|-
| Curvature ||||-48||-46||-43||-40||-40||-44||4
|-
| Zep etch rate||nm/min||||||||||||95||
|-
|
|}


== Comments ==
== Comments ==


Lower temperature certainly looks like a step in the right direction.  Confirms that the process was too etch aggressive previously, hence the isotropic profiles.
Lower temperature certainly looks like a step in the right direction.  Confirms that the process was too etch aggressive previously, hence the isotropic profiles.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12"