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Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

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=<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> =
=<span style="color:#FF0000"> This optical profiler has been decommissioned and replaced by the S Neox system, which is very similar </span> =


=Results from the Optical Profiler (Sensofar) acceptance test=
=Results from the Optical Profiler (Sensofar) acceptance test=


The acceptance test was performed in January 2012 by ST Instruments and Sensofar together with  
The acceptance test was performed in January 2012 by ST Instruments and Sensofar together with  
Pernille V. Larsen@nanolab and Berit G. Herstrøm@nanolab.
Pernille V. Larsen@ DTU nanolab and Berit G. Herstrøm @ DTU nanolab.


==This Table shows an overview of the acceptance tests==
==This Table shows an overview of the acceptance tests==