Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano14: Difference between revisions

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+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano14 click here]'''
+<!--Checked for updates on 30/7-2018 - ok/jmli -->
+<!--Checked for updates on 5/10-2020 - ok/jmli -->
+<!--Checked for updates on 4/9-2025 - ok/jmli -->
 == The nano1.4 recipe ==
+{{Template:Author-jmli1}}
+<!--Checked for updates on 2/02-2023 - ok/jmli -->
 {| border="2" cellpadding="2" cellspacing="1"
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 C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -20 degs, 120 secs
 </gallery>
+{| {{table}}
+| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
+| align="center" style="background:#f0f0f0;"|''''''
+| align="center" style="background:#f0f0f0;"|'''30'''
+| align="center" style="background:#f0f0f0;"|'''60'''
+| align="center" style="background:#f0f0f0;"|'''90'''
+| align="center" style="background:#f0f0f0;"|'''120'''
+| align="center" style="background:#f0f0f0;"|'''150'''
+| align="center" style="background:#f0f0f0;"|'''Average'''
+| align="center" style="background:#f0f0f0;"|'''Std. dev.'''
+|-
+| Etch rates||nm/min||168||182||185||189||191||183||9
+|-
+| Sidewall angle||degs||91||91||91||91||90||91||0
+|-
+| CD loss||nm/edge||7||-3||-3||-25||-26||-10||15
+|-
+| CD loss foot||nm/edge||12||9||10||-11||1||4||9
+|-
+| Bowing||||9||6||4||5||7||6||2
+|-
+| Bottom curvature||||-47||-34||-34||-26||-19||-32||10
+|-
+| zep||nm/min||||||||||||67||
+|-
+|
+|}