Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/Cassettes: Difference between revisions

← Older edit
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
 
(17 intermediate revisions by the same user not shown)
Line 58: Line 58:


As the smaller slots are quite narrow and suffer from a significant y-axis offset, it can be necessary to apply an offset for correct placement. The offset indicated below is the observed offset, hence to counter it one must apply a y-axis offset in the opposite direction.
As the smaller slots are quite narrow and suffer from a significant y-axis offset, it can be necessary to apply an offset for correct placement. The offset indicated below is the observed offset, hence to counter it one must apply a y-axis offset in the opposite direction.
==Wafer exposable area==
As the wafer is clamped to the cassette a small portion along the circumference is covered by the cassette and hence this part is not exposable. The exposable diameter for round wafers are:
*2": 44 mm
*4": 93 mm
*6": 138 mm


== Cassette overview ==
== Cassette overview ==
The table below provides details on all available cassettes.
Users of the chip cassettes should notice that there is a significant y-axis offset between the slot center positions and the actual stage position. The measured offsets are indicated in the table. As seen, they are all negative and hence users should apply a positive y-axis offset in order to get the pattern exposed correctly in the center of the slot/substrate.
There is also a minor shift between the pre-aligner coordinates and the actual stage coordinates. These are indicated in the last column. In order to hit the alignment mark on the first scan users should add this offset to the P-mark offset found on the pre-aligner.
{| class="wikitable"
{| class="wikitable"
|+  Cassette overview
|+  Cassette overview
|-
|-
! Substrate size !! ID !! Slot ID !! Material !! Image !! Position indication !! Approximate offset [µm]
! Substrate size !! ID !! Slot ID !! Material !! Image !! Position indication !! Approximate offset [µm] !! PA to stage shift [µm]
|-
|-
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|700px]] || [[image:BM4P-509 small.png|300px]]
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|600px]] || [[image:BM4P-509 small.png|300px]]  


|| Measured 2024-01-05
|| 3A: -810 µm
 
3A: -810 µm


3B: -780 µm
3B: -780 µm
Line 75: Line 86:
3C: -840 µm
3C: -840 µm


3D: -975 µm
3D: -975 µm  
 
||


|-
|-
| Chips || BM4P-510 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-510_cas.png|800px]] || 3A: (80.000, 60.000)
| Chips || BM4P-510 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-510_cas.png|600px]] || [[image:BM4P-509 small.png|300px]] ||
3B: (200.000, 60.000)
 
3C: (80.000, 180.000)
 
3D: (200.000, 180.000)


|-
|-
| 2" || BM6P-006 || 2A, 2B, 2C, 2D, 2E, 2F || Al || [[image:BM6P-006_cas.png|800px]] || 2A: (80.000. 40.000)
| 2" || BM6P-006 || 2A, 2B, 2C, 2D, 2E, 2F || Al || [[image:BM6P-006_cas.png|600px]] || [[image:BM6P-502 small.png|300px]] ||
2B: (200.000. 40.000)
 
2C: (80.000. 120.000)
 
2D: (200.000. 120.000)
 
2E: (80.000. 200.000)
 
2F: (200.000. 200.000)
|-
|-
| 2" || BM6P-502 || 2A, 2B, 2C, 2D, 2E, 2F || Ti || [[image:BM6P-502_cas.png|800px]] || 2A: (80.000. 40.000)
| 2" || BM6P-502 || 2A, 2B, 2C, 2D, 2E, 2F || Ti || [[image:BM6P-502_cas.png|600px]] || [[image:BM6P-502 small.png|300px]] ||
2B: (200.000. 40.000)
 
2C: (80.000. 120.000)
 
2D: (200.000. 120.000)
 
2E: (80.000. 200.000)
 
2F: (200.000. 200.000)
|-
|-
| 3" || BM4P-021 || 3A, 3B, 3C, 3D || Al || [[image:BM4P-021_cas.png|800px]] || 3A: (80.000, 60.000)
| 3" || BM4P-021 || 3A, 3B, 3C, 3D || Al || [[image:BM4P-021_cas.png|600px]] || [[image:BM4P-509 small copy.png|300px]] ||
3B: (200.000, 60.000)
 
3C: (80.000, 180.000)
 
3D: (200.000, 180.000)


|-
|-
| 3" || BM4P-025 || 3A, 3B, 3C, 3D || Al || [[image:BM4P-025_cas.png|800px]] || 3A: (80.000, 60.000)
| 3" || BM4P-025 || 3A, 3B, 3C, 3D || Al || [[image:BM4P-025_cas.png|600px]] || [[image:BM4P-509 small copy.png|300px]] ||
3B: (200.000, 60.000)
 
3C: (80.000, 180.000)
 
3D: (200.000, 180.000)


|-
|-
| 4" || BSPCL-520 || 4A, 4B, 4C || Ti || [[image:BSPCL-520_cas.png|800px]] || 4A: (90.000, 55.000)
| 4" || BSPCL-520 || 4A, 4B, 4C || Ti || [[image:BSPCL-520_cas.png|600px]] || [[image:BSPCL-520 small.png|300px]] || Currently out of use
4B: (210.000, 55.000)
 
4C: (150.000, 185.000)


|-
|-
| 4" || BM2P-011 || 4D, 4E || Al || [[image:BM2P-011_cas.png|800px]] || 4D: (190.000, 65.000)
| 4" || BM2P-011 || 4D, 4E || Al || [[image:BM2P-011_cas.png|600px]] || [[image:BM2P-011 small.png|300px]] || || 4D: (330,150)
4E: (100.000, 175.000)


|-
|-
| 6" || BW6-009 || 6A || Al || [[image:BW6-009.png|800px]] || 6A: (140.000, 120.000)
| 6" || BW6-009 || 6A || Al || [[image:BW6-009.png|600px]] || [[image:BW6-009 small.png|300px]] ||
|-
|-
| 6" || BW6-042 || 6A || Al || [[image:BW6-042_cas.png|800px]] || 6A: (140.000, 120.000)
| 6" || BW6-042 || 6A || Al || [[image:BW6-042_cas.png|600px]] || [[image:BW6-009 small.png|300px]] ||
|-
|-
| 8" || BSPCL-514 || 8A || Ti || [[image:BPSPCL-514_cas.png|800px]] || 8A: (189.000, 73.500)
| 8" || BSPCL-514 || 8A || Ti || [[image:BPSPCL-514_cas.png|600px]] || [[image:BW6-009 small.png|300px]] ||
|-
|-
| Mask || B6025-025 ||  || Ti || [[image:B6025-025.png|800px]] || (140.000, 120.000)
| Mask || B6025-025 ||  || Ti || [[image:B6025-025.png|600px]] || (140.000, 120.000) ||
|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/Cassettes"