|
|
| (3 intermediate revisions by 3 users not shown) |
| Line 1: |
Line 1: |
|
| |
|
|
| |
|
| This is a standard positive resist from ZEON. The resist is out of stock from the manufacturer and also very expensive; DTU Danchip has thus stopped buying this resist. As of August 2016 we have around 0.5L left. Use CSAR instead. | | This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist. |
| | | Use CSAR instead. |
| Contact lithography@danchip.dtu.dk if you wish to use this resist.
| |
| | |
| == Process Flow ==
| |
| | |
| | |
| | |
| {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;"
| |
| |-
| |
| | |
| |-
| |
| |-style="background:Black; color:White"
| |
| !Equipment
| |
| !Process Parameters
| |
| !Comments
| |
| !Initials and date
| |
| |-
| |
| | |
| |-
| |
| |-style="background:WhiteSmoke; color:black; text-align:center"
| |
| !colspan="4"|Pretreatment
| |
| |-
| |
| | |
| | |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |4" Si wafers
| |
| |No Pretreatment
| |
| |
| |
| |TIGRE, 23-04-2014
| |
| |-
| |
| | |
| |-
| |
| |-style="background:WhiteSmoke; color:black; text-align:center"
| |
| !colspan="4"|Spin Coat
| |
| |-
| |
| | |
| | |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |Spin Coater Manual, LabSpin, A-5
| |
| |ZEP520A 1:1 or ZEP520A 1:2 E-beam resist
| |
| 60 sec at various spin speed.
| |
| Acceleration 4000 s-2,
| |
| softbake 2 min at 180 deg Celcius
| |
| |Resist poured directly from bottle or by use of disposable pipette<sup>1</sup>
| |
| |TIGRE, 23-04-2014, 21-05-2014
| |
| |-
| |
| | |
| |-
| |
| |-style="background:WhiteSmoke; color:black; text-align:center"
| |
| !colspan="4"|Characterization
| |
| |-
| |
| | |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |Ellipsometer VASE B-1
| |
| |9 points measured on 100 mm wafer
| |
| |ZEP program used; measured at 70 deg only
| |
| |TIGRE, 23-04-2014, 21-05-2014
| |
| |-
| |
| | |
| |-
| |
| |-style="background:WhiteSmoke; color:black; text-align:center"
| |
| !colspan="4"|E-beam Exposure
| |
| |-
| |
| | |
| | |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |JEOL 9500 E-beam writer, E-1
| |
| |Dosepattern 14nm - 100nm,
| |
| dose 120-280 muC/cm2
| |
| |Virtual chip mark height detection<sup>2</sup>
| |
| | TIGRE
| |
| |-
| |
| | |
| |-
| |
| |-style="background:WhiteSmoke; color:black; text-align:center"
| |
| !colspan="4"|Development
| |
| |-
| |
| | |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |Fumehood, D-3
| |
| |60 sec in N50,
| |
| 60 sec rinse in IPA,
| |
| N2 Blow dry
| |
| |Agitation (by hand) while developing
| |
| | TIGRE, XX-04-2014
| |
| |-
| |
| | |
| |-
| |
| |-style="background:WhiteSmoke; color:black; text-align:center"
| |
| !colspan="4"|Characterization
| |
| |-
| |
| | |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |Zeiss SEM Supra 60VP, D-3
| |
| |
| |
| |
| |
| | TIGRE, ??-04-2014
| |
| |-
| |
| | |
| |}
| |
| | |
| 1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; the bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.
| |
| | |
| 2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.
| |
|
| |
|
| == Spin Curves == | | == Spin Curves == |
| Line 126: |
Line 17: |
| |- | | |- |
| |-style="background:Black; color:White" | | |-style="background:Black; color:White" |
| !colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximatley 3 months old. | | !colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old. |
| |- | | |- |
|
| |
|
| Line 171: |
Line 62: |
| |- | | |- |
| |-style="background:red; color:White" | | |-style="background:red; color:White" |
| !colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old. | | !colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old. |
| |- | | |- |
|
| |
|
| Line 231: |
Line 122: |
| |- | | |- |
| |-style="background:green; color:White" | | |-style="background:green; color:White" |
| !colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old. | | !colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old. |
| |- | | |- |
|
| |
|
