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{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
|-
|-
|-style="background:silver; color:black"
|'''Resist'''
|'''Polarity'''
|'''Manufacturer'''
|'''Comments'''
|'''Technical reports'''
|'''Spinner'''
|'''Developer'''
|'''Rinse'''
|'''Remover'''
|'''Process flows (in docx-format)'''
|-
|-
|-style="background:LightGrey; color:black"
|'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]'''
|Positive
|ZEON
|Positive resist
|[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|ZEP520A spin curves on SSE Spinner]]
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf‎|JJAP-51-06FC05.pdf‎]], [[media:JVB001037.pdf‎|JVB001037.pdf‎]]
|IPA
|acetone/1165
|[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx‎|Process_Flow_ZEP_with_Al.docx‎]]
|}
If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.
== Process Flow ==
Test of ZEP resist; a positive e-beam resist from ZEON.
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;"
|-
|-
|-style="background:Black; color:White"
!Equipment
!Process Parameters
!Comments
!Initials and date
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Pretreatment
|-
|-
|-style="background:LightGrey; color:black"
|4" Si wafers
|No Pretreatment
|
|TIGRE, 23-04-2014
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Spin Coat
|-
|-
|-style="background:LightGrey; color:black"
|Spin Coater Manual, LabSpin, A-5
|ZEP520A 1:1 or ZEP520A 1:2 E-beam resist
60 sec at various spin speed.
Acceleration 4000 s-2,
softbake 2 min at 180 deg Celcius
|Resist poured directly from bottle or by use of disposable pipette<sup>1</sup>
|TIGRE, 23-04-2014, 21-05-2014
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Characterization
|-
|-
|-style="background:LightGrey; color:black"
|Ellipsometer VASE B-1
|9 points measured on 100 mm wafer
|ZEP program used; measured at 70 deg only
|TIGRE, 23-04-2014, 21-05-2014
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|E-beam Exposure
|-
|-
|-style="background:LightGrey; color:black"
|JEOL 9500 E-beam writer, E-1
|Dosepattern 14nm - 100nm,
dose 120-280 muC/cm2
|Virtual chip mark height detection<sup>2</sup>
| TIGRE
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Development
|-
|-
|-style="background:LightGrey; color:black"
|Fumehood, D-3
|60 sec in N50,
60 sec rinse in IPA,
N2 Blow dry
|Agitation (by hand) while developing
| TIGRE, XX-04-2014
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Characterization
|-
|-
|-style="background:LightGrey; color:black"
|Zeiss SEM Supra 60VP, D-3
|
|
| TIGRE, ??-04-2014
|-
|}
1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; the bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.


2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.
This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.  
Use CSAR instead.


== Spin Curves ==
== Spin Curves ==
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|-
|-
|-style="background:Black; color:White"
|-style="background:Black; color:White"
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximatley 3 months old.
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
|-
|-


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|-
|-
|-style="background:red; color:White"
|-style="background:red; color:White"
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
|-
|-


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|-
|-
|-style="background:green; color:White"
|-style="background:green; color:White"
!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
|-
|-


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