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These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.
== Process Flow ==
Test of ZEP resist; a positive e-beam resist from ZEON.
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
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|-style="background:Black; color:White"
!Equipment
!Process Parameters
!Comments
!Initials and date
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|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Pretreatment
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|-
|-style="background:LightGrey; color:black"
|4" Si wafers
|No Pretreatment
|
|TIGRE, 23-04-2014
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|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Spin Coat
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|-style="background:LightGrey; color:black"
|Spin Coater Manual, LabSpin, A-5
|ZEP520A 1:1 E-beam resist
60 sec at various spin speed.
Acceleration 4000 s-2,
softbake 2 min at 180 deg Celcius
|Resist poured directly from bottle or pippette
|TIGRE, 23-04-2014
|-
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|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Characterization
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|-
|-style="background:LightGrey; color:black"
|Ellipsometer VASE B-1
|9 points measured on 100 mm wafer
|ZEP program used; measured at 70 deg only
|TIGRE, 23-04-2014
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|E-beam Exposure
|-
|-
|-style="background:LightGrey; color:black"
|JEOL 9500 E-beam writer, E-1
|Dosepattern 14nm - 100nm,
dose 120-280 muC/cm2
|Virtual chip mark height detection
| TIGRE, 23-04-2014
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Development
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|-
|-style="background:LightGrey; color:black"
|Fumehood, D-3
|60 sec in ,
60 sec rinse in IPA,
N2 Blow dry
|Agitation (by hand) while developing
| TIGRE, XX-04-2014
|-
|-
|-style="background:WhiteSmoke; color:black; text-align:center"
!colspan="4"|Characterization
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|-style="background:LightGrey; color:black"
|Zeiss SEM Supra 60VP, D-3
|
|
| TIGRE, ??-04-2014
|-
|}




This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.
Use CSAR instead.


== Spin Curves ==
== Spin Curves ==




[[File:SpinCurveZEP520A.jpg|right|700px]]
[[File:SpinCurveZEP520A.png|right|700px]]




The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers.


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!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximatley 3 months old.
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
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|-style="background:red; color:White"
|-style="background:red; color:White"
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
!colspan="7"|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
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|-
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|-style="background:green; color:White"
|-style="background:green; color:White"
!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
!colspan="7"|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
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