Specific Process Knowledge/Lithography/NanoImprintLithography: Difference between revisions
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'''Feedback to this section''': '''[mailto:labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/NanoImprintLithography# Imprinter 01 click here]''' | |||
==Imprinter 01== | ==Imprinter 01== | ||
[[Image:imprinterfig1.jpg|300x300px|thumb|Imprinter 01: Positioned in cleanroom F-2]] | |||
The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye). | The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye). | ||
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====Imprint information==== | |||
*[[Specific Process Knowledge/Imprinting|Imprinting]] | |||
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====Imprint resist information and process flows==== | |||
*[[Specific Process Knowledge/Imprinting|Imprinting]] | |||
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==Overview of the performance of the Imprinter 01 and some process related parameters== | ==Overview of the performance of the Imprinter 01 and some process related parameters== | ||