Jump to content

Specific Process Knowledge/Lithography/NanoImprintLithography: Difference between revisions

← Older edit
VisualWikitext
Elkh (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
343 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
No edit summary
 
(11 intermediate revisions by 4 users not shown)
Line 1: Line 1:
==EVG NIL==
{{cc-nanolab}}
[[Image:EVG NIL.jpg|200 × 200px|thumb|right|The EVG NIL is positioned in Cleanroom 4.]]


'''Feedback to this section''':  
'''Feedback to this section''': '''[mailto:labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/NanoImprintLithography# Imprinter 01 click here]'''
'''[mailto:labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/NanoImprintLithography# EVG NIL click here]'''


The EVG NIL is a system for imprinting in polymers (Hot Embossing), and for bonding on wafer scale. 3 different types of bonding can be done: Anodic, Eutectic and Fusion. Furthermore it is possible to align the wafers one wishes to bond. In principle it is also possible to align the substrate and stamp before imprint, but it is much more difficult.
==Imprinter 01==


It is possible to fill bonded cavities with a desired gas. At the moment we have SF6 on the system, but if you would like another one, please contact Rune Christiansen.  
[[Image:imprinterfig1.jpg|300x300px|thumb|Imprinter 01: Positioned in cleanroom F-2]]


The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye).


'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=153 LabManager]'''
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=391 LabManager]'''




<br clear="all" />
<br clear="all" />
==Process information==
====Types of Bonding====
*[[Specific Process Knowledge/Bonding/Eutectic bonding|Eutectic bonding]] 
*[[Specific Process Knowledge/Bonding/Fusion bonding|Fusion bonding]]
*[[Specific Process Knowledge/Bonding/Anodic bonding|Anodic bonding]]


====Imprint information====
====Imprint information====
Line 24: Line 18:


<br clear="all" />
<br clear="all" />
==Overview of the performance of the EVG NIL and some process related parameters==
 
<br clear="all" />
 
====Imprint resist information and process flows====
*[[Specific Process Knowledge/Imprinting|Imprinting]]
 
<br clear="all" />
 
==Overview of the performance of the Imprinter 01 and some process related parameters==


{| border="2" cellspacing="0" cellpadding="10"  
{| border="2" cellspacing="0" cellpadding="10"  
|-
|-
!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="left"|Purpose  
|style="background:LightGrey; color:black"|Imprint and bonding
|style="background:LightGrey; color:black"|  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Eutectic bonding
*Fusion bonding
*Anodic bonding
*Imprinting
*Imprinting
|-
|-
Line 39: Line 38:
|style="background:LightGrey; color:black"|Alignment accuracy
|style="background:LightGrey; color:black"|Alignment accuracy
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*&plusmn; 5 microns for IR alignment
*Only by eye
*&plusmn; 10 microns for backside alignment
 
|-
|-
|-
|-
Line 46: Line 45:
|style="background:LightGrey; color:black"|Process Temperature
|style="background:LightGrey; color:black"|Process Temperature
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Room temperature to 500<math>\rm{^o}</math>C
*Room temperature to 200°C
|-
|-
|style="background:LightGrey; color:black"|Process pressure
|style="background:LightGrey; color:black"|Process pressure
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*~5<math>\cdot</math>10<sup>-4</sup>mbar - 2000mbar
*~5<math>\cdot</math>1mbar - atm
|-
|-
|style="background:LightGrey; color:black"|Piston Force
|style="background:LightGrey; color:black"|Imprint Pressure
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Depending on the area, for 4" wafers 200-20000N.
*0-6 bar
|-
|-
!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Substrates
!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*One 4" or 6" wafer per run
*Pieces to 4" wafers 
*Pieces are only allowed with speciel permission 
|-
|-
| style="background:LightGrey; color:black"|Substrate material allowed
| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Silicon wafers
*Silicon
*Quartz wafers
*Quartz  
*Pyrex wafers
*Pyrex  
|-  
|-  
| style="background:LightGrey; color:black"|Material allowed on the substrate
| style="background:LightGrey; color:black"|Material allowed on the substrate
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/NanoImprintLithography"