Specific Process Knowledge/Lithography/4562: Difference between revisions
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==Spin coating== | ==Spin coating== | ||
[[Image:4562spincurves.JPG|500x500px|thumb|Spin curves for AZ 4562 using | [[Image:4562spincurves.JPG|500x500px|thumb|Spin curves for AZ 4562 using 60 s spin-off and 60 s @ 100°C softbake on LabSpin, and 30 s spin-off and 300 s @ 100°C 1 mm proximity softbake on Gamma]] | ||
'''Typical spin parameters:''' | '''Typical spin parameters:''' | ||
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The thickest achievable coating using a normal spin cycle is 10 µm. However, reducing the spin-off time to a few seconds at 2000 rpm, has successfully been used to increase the coating thickness beyond 20 µm on a Gamma coater. The substrate waits for 1 min before softbake, in order to reduce the edge bead height. | The thickest achievable coating using a normal spin cycle is 10 µm. However, reducing the spin-off time to a few seconds at 2000 rpm, has successfully been used to increase the coating thickness beyond 20 µm on a Gamma coater. The substrate waits for 1 min before softbake, in order to reduce the edge bead height. For these thicker coatings, the softbake time must be increased. | ||
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