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Specific Process Knowledge/Lithography/Resist/UserBottles: Difference between revisions

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'''Procedure for bringing new user resist bottles into the cleanroom:'''
'''Procedure for bringing new user resist bottles into the cleanroom:'''
#''Outside the cleanroom'': Find a blue-capped glass bottle in the cupboard next to office 055 in 346
#''Outside the cleanroom'': Find a blue-cap glass bottle in the storage cabinet, in building 346 next to office 055
#''Gowning'': Clean the bottle in gowning
#''Gowning'': Clean the bottle in gowning
#*Clean it thoroughly on the outside with water or alcohol
#*Clean it thoroughly on the outside with water or alcohol
#''Fumehood'': Bring the bottle to a fumehood inside the cleanroom
#''Fumehood'': Bring the bottle to a fume hood inside the cleanroom
#* Clean the bottle and the lid thoroughly on the inside with a relevant solvent, i.e for CSAR use anisole and for 5214 use acteone<br>If you are in doubt about which solvent your resist contains, consult the MSDS of the resist on [http://kemibrug.dk/searchpage/ Kemibrug] - '''requires login'''
#* Clean the bottle and the lid thoroughly on the inside with a relevant solvent, i.e. for CSAR use anisole and for 5214 use acetone<br>If you are in doubt about which solvent your resist contains, consult the MSDS of the resist on [http://kemibrug.dk/searchpage/ Kemibrug] - '''requires login'''
#*If you need to dilute the resist, find a measurement beaker and clean it thoroughly with the same solvent as you used for cleaning your own bottle. For CSAR, ZEP, mr EBL, and anisole-based PMMA, you can use the measurement beaker in the box inside the fumehood in E-4
#*If you need to dilute the resist, find a measurement beaker and clean it thoroughly with the same solvent as you used for cleaning your own bottle. For CSAR, ZEP, mr EBL, and anisole-based PMMA, you can use the measurement beaker in the box inside the fume hood in E-4
#Let the bottle dry in the fumehood
#Let the bottle dry in the fume hood
#Take the supply resist bottle from the chemical cabinet, and place it in the fumehood next to your own cleaned bottle
#Take the supply resist bottle from the chemical cabinet, and place it in the fume hood next to your own cleaned bottle
#Carefully unscrew the lid of the resist bottle
#Carefully unscrew the lid of the resist bottle
#''Only if necessary'': Wipe the thread of the resist bottle before you pour resist into your own bottle. You must wipe in such a way, that you do not create particles, which fall into the resist bottle
#''Only if necessary'': Wipe the thread of the resist bottle before you pour resist into your own bottle. You must wipe in such a way, that you do not create particles, which fall into the resist bottle
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'''Remember to label your resist bottle correctly - bottles without correct labels will be removed from the cleanroom:'''<br>
'''<span style="color:red">Remember to label your resist bottle correctly - bottles without correct labels will be removed from the cleanroom:</span>'''<br>
#Find the label which matches your resist and write the following on it:
#Find the label which matches your resist and write the following on it:
#*Your name (initials)
#*Your name (initials)
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'''Use pipettes for resist transfer:'''
'''Use pipettes for resist transfer:'''


When spin coating thin resist, you should always use a pipette, to transfer resist from your bottle to the substrate. If you pour the resist directly from your bottle, you will leave resist in the bottle threading, which will dry and create particles in the resist. The disposable pipettes need to be thoroughly cleaned with a N2 gun before use, for ~20 seconds. After some practice, you can obtain particle-free 4" wafers, if the bottle and pipette (and spin coater) are properly cleaned.
When spin coating thin resist, you should always use a pipette, to transfer resist from your bottle to the substrate. If you pour the resist directly from your bottle, you will leave resist in the bottle threading, which will dry and create particles in the resist. The disposable pipettes need to be thoroughly cleaned with a N2 gun before use, for ~20 seconds. After some practice, you can obtain particle-free 4" wafers, if the bottle and pipette (and spin coater) are properly cleaned.  
 
It can be difficult to use the pipettes for thick resists, and youmay need to simply pour it from the bottle. Remember to wipe the bottle thread after pouring. It is essential that you wipe in such a way, that you do not create particles, which fall into the resist bottle.