Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions

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 == SETWFR and CHIPAL setup ==
-The alignment procedure is setup using the same subprograms as usual. The only difference is that we select a different scan type. Thus, in the "Scan Condition Settings" window, in the "Scan Type" pane, we select "Arbitrary shape" instead of the usual "Cross mark". This enables the "2D" pane of the settings window. In the "2D" pane we can now set a scan size, which should be similar to the feature size or slightly larger. With the "Reference" button we can select the reference image file previously generated.
+The alignment procedure is setup using the same subprograms as usual. The only difference is that we select a different scan type. Thus, in the "Scan Condition Settings" window, in the "Scan Type" pane, we select "Arbitrary shape" instead of the usual "Cross mark". This enables the "2D" pane of the settings window. In the "2D" pane we can now set a scan size, which should be similar to the feature size or slightly larger. With the "Reference" button we can select the reference image file previously generated. In this example we use a cross but as the "Arbitrary shape" scan type suggests, an arbitrary shape can be used.
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