Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions
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==Aluminium Anneal furnace (C4) | [[index.php?title=Category:Equipment|Thermal C4]] | ||
[[index.php?title=Category:Thermal process|C4]] | |||
[[index.php?title=Category:Furnaces|C4]] | |||
=Aluminium Anneal furnace (C4)= | |||
[[Image:C4helstak.jpg |thumb|300x300px|Aluminium Anneal furnace (C4). Positioned in cleanroom B-1. /Photo: DTU Nanolab internal]] | [[Image:C4helstak.jpg |thumb|300x300px|Aluminium Anneal furnace (C4). Positioned in cleanroom B-1. /Photo: DTU Nanolab internal]] | ||
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*N<sub>2</sub> (nitrogen): 0-10 SLM | *N<sub>2</sub> (nitrogen): 0-10 SLM | ||
*O<sub>2</sub> (oxygen): 0-10 SLM | *O<sub>2</sub> (oxygen): 0-10 SLM | ||
*Forming gas (5% H<sub>2</sub>/95 % N<sub>2</sub>): 0-5 SLM - | *Forming gas (5% H<sub>2</sub>/95 % N<sub>2</sub>): 0-5 SLM - Max 1 hour | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | ||