Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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*In E-2, all users must keep within the area between the front side of the machine and the table with the pre-aligner setup. Only JEOL staff or DTU Nanolab staff may access the backside of the machine. | *In E-2, all users must keep within the area between the front side of the machine and the table with the pre-aligner setup. Only JEOL staff or DTU Nanolab staff may access the backside of the machine. | ||
*No users, not even authorised users, are allowed to load a substrate into the autoloader (robot loader). | *No users, not even authorised users, are allowed to load a substrate into the autoloader (robot loader). | ||
*After your exposure, fully trained users can unload their cassettes from the autoloader | *After your exposure, fully trained users can unload their cassettes from the autoloader and unmount their substrates . | ||
*If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Nanolab personel unmount your substrates. | *If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Nanolab personel unmount your substrates. | ||
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[[File:IMG_0186.jpg|600px|right]] | [[File:IMG_0186.jpg|600px|right]] | ||
For safety reasons, users are only authorized to unload cassettes from | For safety reasons, users are only authorized to unload cassettes from the autoloader. | ||
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|[[File:SFOCUS.png|500px]] | |[[File:SFOCUS.png|500px]] | ||
|SFOCUS uses the bottom AE mark to measure the beam diameter while adjusting the objective lens. The objective lens is defined to be in focus where the machine finds the minimum beam diameter. This program can also be used to observe the depth of focus of a certain condition file. The graph shows the beam diameter versus position of objective lens. The position of the objective lens is converted to a difference in substrate height by executing the subprogram 'HCOEFFI'. <br><br> Please note, that SFOCUS does not work well for currents larger than 6 nA; at higher currents the focus should be set manually. This is to be done by DTU | |SFOCUS uses the bottom AE mark to measure the beam diameter while adjusting the objective lens. The objective lens is defined to be in focus where the machine finds the minimum beam diameter. This program can also be used to observe the depth of focus of a certain condition file. The graph shows the beam diameter versus position of objective lens. The position of the objective lens is converted to a difference in substrate height by executing the subprogram 'HCOEFFI'. <br><br> Please note, that SFOCUS does not work well for currents larger than 6 nA; at higher currents the focus should be set manually. This is to be done by DTU Nanolab staff only. | ||
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HEIMAP is a sub program that measures height of the substrate with an IR laser. The incidence angle of the laser is 73 degrees. | HEIMAP is a sub program that measures height of the substrate with an IR laser. The incidence angle of the laser is 73 degrees. | ||
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