Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/RTP_Jipelec_2 click here]''' | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/RTP_Jipelec_2 click here]''' | ||
[[Category: Equipment |Thermal Jipelec]] | [[index.php?title=Category:Equipment|Thermal Jipelec]] | ||
[[Category: Thermal process|Jipelec]] | [[index.php?title=Category:Thermal process|Jipelec]] | ||
=RTP2 Jipelec - Rapid Thermal Processor= | =RTP2 Jipelec - Rapid Thermal Processor= | ||
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|style="background:WhiteSmoke; color:black;" align="left"|5/6 mbar, if minimum gas flow is used during process. | |style="background:WhiteSmoke; color:black;" align="left"|5/6 mbar, if minimum gas flow is used during process. | ||
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! | ! rowspan="7" |Process time | ||
| style="background:Silver; color:black" |At 1100 <sup>o</sup>C | |||
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|style="background:Silver; color:black"|At 1100 <sup>o</sup>C | |||
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*Max. 5 minutes | *Max. 5 minutes | ||
|style="background:WhiteSmoke; color:black;" align="left"| | | style="background:WhiteSmoke; color:black;" align="left" | | ||
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|style="background:Silver; color:black"|At 1000 <sup>o</sup>C | |style="background:Silver; color:black"|At 1000 <sup>o</sup>C | ||
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*Quartz | *Quartz | ||
*Metals - ask for permisson | *Metals - ask for permisson | ||
*III-V materials - '''these cannot be heated above 450 °C,''' otherwise it can lead to outgassing of toxic gases. For that reason, '''III-V samples are limited to a maximum process temperature of | *III-V materials - '''these cannot be heated above 450 °C,''' otherwise it can lead to outgassing of toxic gases. For that reason, '''III-V samples are limited to a maximum process temperature of 400 °C.''' | ||
|style="background:WhiteSmoke; color:black;" align="left"| Always check the cross contamination information in LabManager to see whether your samples are allowed in the RTP2 Jipelec before using it. If you want to anneal sample materials that are not on the list or not approved, please contact the Thin Film group | |style="background:WhiteSmoke; color:black;" align="left"| Always check the cross contamination information in LabManager to see whether your samples are allowed in the RTP2 Jipelec before using it. If you want to anneal sample materials that are not on the list or not approved, please contact the Thin Film group | ||
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==Existing PID and Pyro Calibration Tables== | ==Existing PID and Pyro Calibration Tables== | ||
In order to guarantee a smooth temperature control while processing, it is important that the right couple of tables - PID and Pyrometer Calibration - are selected in the recipe. There are multiple PID and Pyro Calibration tables available at the tool, which were developed and optimized by the process specialists in the Thin Film group. These are material-dependent, so they are labeled with abreviations of the conditions | As mentioned before, the temperature inside the chamber is controlled by either using a thermocouple and/or an optical pyrometer. In order to guarantee a smooth temperature control while processing, it is important that the right couple of tables - PID and Pyrometer Calibration - are selected in the recipe. There are multiple PID and Pyro Calibration tables available at the tool, which were developed and optimized by the process specialists in the Thin Film group. These are material- and sensor-dependent, so they are labeled with abreviations of the conditions they should be used for. You can access the list of the existing tables in the '''[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=459 tool's Labmanager page]''', under documents. | ||
*PID tables - This table contains the | *PID tables - This table contains the essential coefficients that manage the lamps' power output, ensuring a smooth and controlled process to maintain the temperature at the desired setpoint during processing. | ||
*Pyro Cal Tables - | *Pyro Cal Tables - Calibrating the optical pyrometer requires the use of a thermocouple as a reference, given that optical pyrometry is a non-contact temperature measurement method. As a result of such calibration process, a table is created. The pyrometer calibration table correlates temperatures recorded by the reference thermocouple with the electrical signals produced by the pyrometer. Essentially, this table functions as a 'translator,' indicating to the user the temperature corresponding to a specific output from the pyrometer. | ||
==Additional information== | ==Additional information== | ||
The '''user manual''', user '''APV''', '''technical documents and contact information''' can be found in LabManager: '''[http://www.labmanager.dtu.dk/function.php?module=Machine&view=view&mach=459 RTP2 Jipelec]''' | The '''user manual''', user '''APV''', '''technical documents and contact information''' can be found in LabManager: '''[http://www.labmanager.dtu.dk/function.php?module=Machine&view=view&mach=459 RTP2 Jipelec]''' | ||