Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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image:Al2O3_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer. | image:Al2O3_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer. | ||
image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | ||
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image:TiO2_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer. | image:TiO2_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer. | ||
image:TiO2_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | image:TiO2_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | ||
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image:XPS_depth_Al_10_AL.jpg| Al 2p signal multilayers. | image:XPS_depth_Al_10_AL.jpg| Al 2p signal multilayers. | ||
image:XPS_depth_Al_10_Ti.jpg| Ti 2p signal multilayers. | image:XPS_depth_Al_10_Ti.jpg| Ti 2p signal multilayers. | ||