Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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-This page describes non standart recipes including multilayers structures.
+{{cc-nanolab}}
+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers click here]'''
+<br>
+<br>
+This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.
+<br>
+<br>
 ==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==
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 Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)
-This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature.
+This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK - requires login] (Phys. Rev. Lett. 115(17) 2015, 177402)
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 |}
-%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%
+The uniformity, thickness, refractive index has been obtained using [[Specific_Process_Knowledge/Characterization/Optical_characterization#Ellipsometer|Ellipsometer VASE]].
+<gallery caption="" widths="400px" heights="350px" perrow="2">
+image:Al2O3_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer.
+image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer.
+</gallery>
+<br clear="all" />
+<b>Evgeniy Shkondin, DTU Nanolab, 2014-2016.</b>
+<br clear="all" />
+<br clear="all" />
 ==Low temperature deposition of TiO<sub>2</sub>==
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 Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C)
+This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK - requires longin] (Phys. Rev. Lett. 115(17) 2015, 177402)
+{| border="2" cellspacing="2" cellpadding="3" colspan="10"
+|bgcolor="#98FB98" |'''TiO<sub>2</sub> deposition at 120 <sup>o</sup>C'''
+|-
+|
+{| {{table}}
+| align="center" |
+{| border="2" cellspacing="2" cellpadding="3"  align="center" style="width:750px"
+! colspan="5" |Deposition conditions at 120 <sup>o</sup>C for TiO2 LT recipe
+|-
+!Number of cycles
+|<b>Thickness (nm)</b>
+|<b>Uniformity across 100mm Si substrate (%)</b>
+|<b>Standard deviation error</b>
+|<b>Refractive index @ 632.8 nm</b>
+|-
+|250
+|10.17
+|2.19
+|0.14
+|2.18
+|-
+|500
+|23.12
+|1.80
+|0.23
+|2.40
+|-
+|750
+|34.13
+|1.87
+|0.39
+|2.39
+|-
+|1000
+|46.13
+|1.78
+|0.50
+|2.39
+|-
+|}
+|-
+|}
+|}
+%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%
+The uniformity, thickness, refractive index has been obtained using [[Specific_Process_Knowledge/Characterization/Optical_characterization#Ellipsometer|Ellipsometer VASE]].
+<gallery caption="" widths="400px" heights="350px" perrow="2">
+image:TiO2_LT_Thickness.JPG| Measured thickness distribution across 100 mm wafer.
+image:TiO2_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer.
+</gallery>
+<br clear="all" />
+<b>Evgeniy Shkondin, DTU Nanolab, 2014-2016.</b>
+<br clear="all" />
+<br clear="all" />
 ==Low temperature grown multilayers on flat surfaces==
-Recipe: EMA01
+<b>Recipe: EMA01</b>
+<b>Recipe: EMA02</b>
+<b>Recipe: EMA03</b>
+<b>Recipe: EMA04</b>
+<b>Temperature: 120 <sup>o</sup>C</b>
+All four recipes is based on <b>Al2O3_LT</b> amd <b>TiO2_LT</b> above mentioned low temperature recipes. Optical research based on fabricated Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> multilayers has been published [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK] (Phys. Rev. Lett. 115(17) 2015, 177402)
+<gallery caption="" widths="1000px" heights="700px" perrow="1">
+image:multilayers222.jpg| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers.
+</gallery>
-Recipe: EMA02
+<br clear="all" />
+<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
+<br clear="all" />
+<br clear="all" />
-Recipe: EMA03
-Recipe: EMA04
+===Investigation of chemical composition in multilayers system===
-Temperature: 120 <sup>o</sup>C
+Chemical tace analysis has been performed using [[Specific_Process_Knowledge/Characterization/XPS/K-Alpha|XPS K-Alpha]] equipment in depth profile mode.
+<gallery caption="" widths="1000px" heights="1000px" perrow="1">
+image:XPS_depth_multi_survey.JPG| Survey scan.
+</gallery>
+<br clear="all" />
+<gallery caption="" widths="400px" heights="350px" perrow="2">
+image:XPS_depth_Al_10_AL.jpg| Al 2p signal multilayers.
+image:XPS_depth_Al_10_Ti.jpg| Ti 2p signal  multilayers.
+image:XPS_depth_Al_10_O.jpg| O 1s signal  multilayers.
+image:XPS_depth_Al_10_Si.jpg| Si 2p signal  multilayers.
+</gallery>
+<br clear="all" />
+<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
+<br clear="all" />
+<br clear="all" />
 ==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures==
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-<gallery caption="" widths="500px" heights="500px" perrow="2">
+<gallery caption="" widths="1000px" heights="1000px" perrow="1">
 image:Evgeniy Shkondin Si trenches coverd with Al2O3 and TiO2 multilayers using ALD.JPG| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers grown on silicon trenches.
@@ Line 140: / Line 264: @@
 <br clear="all" />
-<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b>
+<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
 <br clear="all" />
 <br clear="all" />