Specific Process Knowledge/Thin film deposition/Deposition of ZnO: Difference between revisions
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=Zinc oxide (ZnO)= | |||
Zinc oxide (ZnO) is a wide‑bandgap (~3.3 eV) n‑type semiconductor that combines high visible transparency, decent carrier mobility, chemical stability, and notable piezoelectricity, while being abundant and non‑toxic. | |||
It is readily deposited by magnetron sputtering for uniform, large‑area films and by atomic layer deposition (ALD) for ultra‑conformal, low‑temperature coatings on complex, high‑aspect‑ratio structures. | |||
As a transparent thin film, ZnO serves as a window/contact in photovoltaics and LEDs and as a transparent electrode when adequately doped or hydrogenated to lower sheet resistance. | |||
In optics and photonics, ZnO functions as a high-index, low-loss dielectric for waveguides, tunable anti-reflective coatings, and Bragg mirrors; its stoichiometry and carrier density allow for control of the refractive index and absorption. | |||
Its piezoelectric and surface‑active nature underpins surface‑acoustic‑wave devices, microphones, nanogenerators, and highly responsive UV and gas sensors. | |||
Beyond these, polycrystalline ZnO varistors are standard for surge protection, and patterned or hybrid ZnO stacks enable transparent heaters, low-emissivity/IR-control, and EMI-shielding coatings, while offering good hardness and corrosion resistance. | |||
==Deposition of ZnO== | |||
ZnO can be deposited by the Sputtering process and atomic layer deposition (ALD). In the chart below, you can compare the different deposition equipment. | |||
*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ZnO deposition using ALD|ZnO deposition using ALD]] | |||
*[[Specific Process Knowledge/Thin film deposition/Deposition of ZnO/ZnO deposition in Sputter System (Lesker)|ZnO deposition in Sputter System (Lesker)]] | |||