Specific Process Knowledge/Thin film deposition/Deposition of NiV: Difference between revisions
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==Sputtering of Nickel Vanadium== | ==Sputtering of Nickel Vanadium== | ||
Nickel Vanadium may be sputter deposited in the Sputter-system (Lesker) and the Sputter-system Metal-Oxide. The following pages show both process parameters and data on surface roughness of the deposited films: | Nickel Vanadium may be sputter deposited in the Sputter-system (Lesker) and the Sputter-system Metal-Oxide (PC1). The following pages show both process parameters and data on surface roughness of the deposited films: | ||
* [[/Sputtering of NiV in Lesker|Sputtering of NiV in Lesker]] | * [[/Sputtering of NiV in Lesker|Sputtering of NiV in Sputter-System (Lesker)]] | ||
* [[/Sputtering of NiV in Sputter-System Metal-Oxide (PC1)|Sputtering of NiV in Sputter-System Metal-Oxide (PC1)]] | * [[/Sputtering of NiV in Sputter-System Metal-Oxide (PC1)|Sputtering of NiV in Sputter-System Metal-Oxide (PC1)]] | ||
* [[/Sputtering of NiV in Wordentec|Sputtering of NiV in Wordentec]] (tool now decommissioned, but results | * [[/Sputtering of NiV in Wordentec|Sputtering of NiV in Wordentec]] (tool now decommissioned, but results are of general interest) | ||