Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Slow etch: Difference between revisions
No edit summary |
|||
| (11 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
=The slow etch= | =The slow etch= | ||
'''''This work is done by Berit Herstrøm @Nanolab | '''''This work is done by Berit Herstrøm @DTU Nanolab, is nothing else is stated''''' <br> | ||
The slow etch is designed to etch slow at low powers to etch thin films and to avoid overheating of samples mounted on a carrier with Capton/polyimide tape | The slow etch is designed to etch slow at low powers to etch thin films and to avoid overheating of samples mounted on a carrier with Capton/polyimide tape | ||
| Line 58: | Line 58: | ||
|- | |- | ||
|Etch rate of SiO2 | |Etch rate of SiO2 | ||
|'''~42nm/min [41-43 nm/min over a 6" wafer] | |'''~42nm/min [41-43 nm/min over a 6" wafer] | ||
|'''13.7-14.7 nm/min [4" on carrier] | |'''13.7-14.7 nm/min [4" on carrier] | ||
| Line 72: | Line 72: | ||
|- | |- | ||
|Tested etch time without burning the resist | |Tested etch time without burning the resist | ||
|3 min | |3 min (6 min => resist burned) | ||
|30 min | |30 min | ||
|- | |- | ||
| Line 81: | Line 81: | ||
|} | |} | ||
==Etch Profile SEM images== | |||
<gallery caption="Profile of etch for 'Slow Etch2' 12 min, 100mm wafer on 150mm carrier with double side polyimide tape (capton), Si3N4 from LPCVD" widths="300px done by bghe, DTU Nanolab" heights="300px" widths="400px" perrow="3"> | |||
File:C08507_01.jpg | |||
File:C08507_02.jpg | |||
File:C08507_04.jpg | |||
</gallery> | |||
==Etch Uniformity maps== | |||
<br clear="all" /> | <br clear="all" /> | ||
<gallery caption="Map of etch rate measurements for 'Slow Etch'" widths="300px" heights="300px" perrow="2"> | <gallery caption="Map of etch rate measurements for 'Slow Etch'" widths="300px" heights="300px" perrow="2"> | ||
| Line 94: | Line 102: | ||
File:Contour Plot etch rates Si.jpg|Etch rate map of Si etch on 4" wafer (on 6" carrier) | File:Contour Plot etch rates Si.jpg|Etch rate map of Si etch on 4" wafer (on 6" carrier) | ||
</gallery> | </gallery> | ||
==Test section - do not use== | |||
{| class="wikitable" | |||
|+ Caption text | |||
|- | |||
! A !! Header text !! Header text | |||
|- | |||
| Example || Example || Example | |||
|- | |||
| Example || Example || Example | |||
|- | |||
| Example || Example || Example | |||
|} | |||