Specific Process Knowledge/Characterization/Dektak XTA: Difference between revisions
No edit summary |
|||
| (One intermediate revision by the same user not shown) | |||
| Line 6: | Line 6: | ||
=Dektak XTA (Stylus Profiler)= | =Dektak XTA (Stylus Profiler)= | ||
[[image:Dektak XTA new.JPG|275x275px|right|thumb|Dektak XTA. Now in cleanroom C-1, at time of photo it was somewhere else.]] | |||
The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions. | The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions. | ||
| Line 11: | Line 13: | ||
A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the [[Specific_Process_Knowledge/Characterization/Tencor_P17|P17 profiler]]. | A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the [[Specific_Process_Knowledge/Characterization/Tencor_P17|P17 profiler]]. | ||
The user manual, quality control procedure and results, technical information and contact information can be found in [http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=304 '''LabManager''']. | |||
The user manual, quality control procedure and results, technical information and contact information can be found in [http://labmanager. | |||
<br> | <br> | ||
Information on measurement accuracy and reproducibility for the stylus profilers may be found [[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|here]] | Information on measurement accuracy and reproducibility for the stylus profilers may be found [[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|here]]. | ||
<br> | <br> | ||
==Performance and Process Parameters== | ==Performance and Process Parameters== | ||
{| border="2" cellspacing="0" cellpadding="10" | {| border="2" cellspacing="0" cellpadding="10" | ||
| Line 65: | Line 64: | ||
*5 µm 45<sup>o</sup> cone | *5 µm 45<sup>o</sup> cone | ||
|- | |- | ||
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates | !style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates and films | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Up to 6" | *Up to 6" | ||
|- | |- | ||
| style="background:LightGrey; color:black"| | | style="background:LightGrey; color:black"|Materials allowed | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*All materials that do not stick to the tip or leave residues | *All materials that do not stick to the tip or leave residues | ||