Specific Process Knowledge/Characterization/XRD/XRD SmartLab: Difference between revisions

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 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab click here]'''
+<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br>
+All images and photos on this page belongs to <b>DTU Nanolab</b></i>
 = XRD SmartLab =
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 The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.
-[[image:XRD_SmartLab.jpg|200x200px|right|thumb|The XRD SmartLab located in cleanroom F-2]]
+[[image:XRD_SmartLab.jpg|400x400px|right|thumb|The XRD SmartLab located in cleanroom F-2]]
 '''The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:'''
-[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=428 XRD SmartLab in LabManager]
+[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=428 XRD SmartLab in LabManager]  - requires login
+'''For XRD SmartLab Users at Nanolab:''' There's a bug in the software in the cleanroom, so the Parts Help doesn't show up with useful information about the optics used in Optical and Sample Alignment when you click the '?'. We copied the Parts Help from the newer XRD Rot Anode so you can the information:
+*On the Desktop of the Smartlab computer in the cleanroom
+*In the Cleanroom Drive under _Equipment/XRD/PartsHelp_fromXRDRotAnode_SLSII
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-The measurement settings and results of the pre-acceptance test are described in this document, also found on the Cleanroom drive:
+The measurement settings and results of the pre-acceptance test are described in this document, also found on the Lab Manager:
-[[:File:SmartLab_Report_DTUv1.pdf]]
+*[https://labmanager.dtu.dk/view_binary.php?fileId=5413| (FAT) Factory Acceptance Test]  - requires login
+The same measurement were completed as part of the acceptance, but no report was generated. In addition the inspection certificate is available here:
+*[https://labmanager.dtu.dk/view_binary.php?fileId=5414| (SAT) Site Acceptance Test]  - requires login
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 * Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Aluminium/Al_Ebeam_evaporation_in_Temescal|e-beam deposited Al thin films]].
-* Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].
+* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Aluminium/Al_Sputtering_in_Cluster_Lesker_PC3#X-ray_reflectivity_analysis|DC sputtered Al thin films]].
+* Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR#X-ray_reflectivity_results|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].
+* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_CrSi#X-ray_Reflectivity_Analysis|Sputtered deposited CrSi bilayer]].
+* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_MgO#X-Ray_Reflectivity|Sputtered deposited MgO thin films]].
+* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium/Sc_Sputtering_in_Cluster_Lesker_PC3#X-ray_Reflectivity_(XRR)|Sputtered deposited Sc thin films]].
+* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium_Nitride/ScN_Reactive_Sputtering_in_Cluster_Lesker_PC3#X-ray_Reflectivity_(XRR)|Sputtered deposited ScN thin films]].
+<!-- * Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].-->
+==Grazing Incidence X-ray Diffraction XRD (GiXRD)==
+* Evaluation of [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in GiXRD|Instrumental broading in GiXRD]].
+==θ/2θ X-ray Diffraction==
+* Evaluation of [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in T2T|Instrumental broadening in symmetrical θ/2θ measurements]].
 ==Equipment performance and process related parameters==
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 .4 mm x 8 mm (Line/Point)
 |-
-!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Goniometer
+!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Goniometer
 |style="background:LightGrey; color:black"|
 Scanning mode
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 *Rx,Ry:-5~+5°
 |-
-|style="background:LightGrey; color:black"|
-Sample size
-|style="background:WhiteSmoke; color:black"|
-Diameter: 150 mm
-Thickness: 0~21 mm
-|-
 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics
 |style="background:LightGrey; color:black"|Incident side
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 |style="background:LightGrey; color:black"|Substrate size
 |style="background:WhiteSmoke; color:black"|
-up to 150 mm wafers
+up to 150 mm wafers; thickness up to 21 mm
 |-
 | style="background:LightGrey; color:black"|Allowed materials
 |style="background:WhiteSmoke; color:black"|
-All materials
+All materials allowed in the cleanroom
 |-
 |}
 <br clear="all" />