Specific Process Knowledge/Thermal Process/Oxidation/Standard oxidation recipes: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]''' | ||
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span> | |||
=Standard Oxidation Recipes= | |||
On this page the steps in the standard oxidation recipes on the furnaces will be | The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers. On this page the steps in the standard oxidation recipes on the furnaces will be listed. | ||
'''Dry oxidation can be done in following furnaces:''' | |||
*A1 Boron Drive-in and Pre-dep furnace | *A1 Boron Drive-in and Pre-dep furnace | ||
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*C3 Anneal-Bond furnace | *C3 Anneal-Bond furnace | ||
*Multipurpose Anneal furnace | *Multipurpose Anneal furnace | ||
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The dry oxidation recipes in the A- and C-stack furnaces are very similar and will be described on this page. | The dry oxidation recipes in the A- and C-stack furnaces are very similar and will be described on this page. | ||
There are no standard recipes on the Multipurpose Anneal furnace, so no oxidation recipes will be described here. | There are no standard recipes on the Multipurpose Anneal furnace, so no oxidation recipes will be described here. | ||
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'''Wet oxidation can be done in these furnaces:''' | |||
*A1 Boron Drive-in and Pre-dep furnace | *A1 Boron Drive-in and Pre-dep furnace | ||
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However, there are a few differences in recipes, because water vapour can be generated by either a torch, a steamer or a bubbler. More information can be found on each furnace page. | However, there are a few differences in recipes, because water vapour can be generated by either a torch, a steamer or a bubbler. More information can be found on each furnace page. | ||
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'''General Remarks for Oxidation Recipes:''' | |||
The oxidation temperature is fixed in each recipe. The temperature can be seen in the recipe name, e.g. "DRY1000" for dry oxidation at 1000 C and "WET1100" for wet oxidation at 1100 C. | The oxidation temperature is fixed in each recipe. The temperature can be seen in the recipe name, e.g. "DRY1000" for dry oxidation at 1000 C and "WET1100" for wet oxidation at 1100 C. | ||
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The annealing improves... The standard annealing time is 20 minutes, but it is possible to change the time. | The annealing improves... The standard annealing time is 20 minutes, but it is possible to change the time. | ||
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==Dry Oxidation Process Steps== | |||
==Dry | |||
'''00 STANDBY''' | '''00 STANDBY''' | ||
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''Message: "Standby"'' | ''Message: "Standby"'' | ||
This will be the active step, when the furnace is not in use, and when a recipe is selected. | |||
If a recipe is aborted, it will jump to the STANDBY step. | If a recipe is aborted, it will also jump to the STANDBY step. | ||
In the standby step, the furnace is closed and kept clean by an N<sub>2</sub> flow. | |||
* Standby temperature: 700 <sup>o</sup>C | *Standby temperature: 700 <sup>o</sup>C | ||
* N<sub>2</sub> flow: 3 SLM | *N<sub>2</sub> flow: 3 SLM | ||
* O<sub>2</sub> flow: 0 SLM | *O<sub>2</sub> flow: 0 SLM | ||
The user has to press "Start" (on the touch screen or furnace computer) to start the recipe. | The user has to press "Start" (on the touch screen or furnace computer) to start the recipe. | ||
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'''01 LM-LOCK''' | '''01 LM-LOCK''' | ||
The recipe can only continue, if a user is logged on in LabManager, otherwise the furnace will shown an alarm (digital input 6) after 1 minute. | |||
The recipe can only continue, if a user is logged on in LabManager | |||
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When the furnace is open, the user can load wafers in the furnace. | When the furnace is open, the user can load wafers in the furnace. | ||
The user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace. | The quartz boat for the wafers is located in furnace, so it has to be liftet down on the quartz plate, before the wafers are loaded. | ||
After the wafers are loaded, the user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace. | |||
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''Message: "Boat moving"'' | ''Message: "Boat moving"'' | ||
The furnace | The furnace closes. | ||
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''Message: "Heat-up"'' | ''Message: "Heat-up"'' | ||
The furnace | The furnace heats up to the temperature defined in the recipe (usually 800-1150 <sup>o</sup>C). | ||
The recipe will continue to the next step, when the temperature of center heating zone (zone 2) reaches the right temperature. | The recipe will continue to the next step, when the temperature of center heating zone (zone 2) reaches the right temperature. | ||
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'''06 OXIDATION''' | '''06 OXIDATION''' | ||
''Message: " | ''Message: "Oxidation"'' | ||
The dry oxidation is started by flowing O<sub>2</sub> through the furnace instead of N<sub>2</sub. | |||
*O<sub>2</sub> flow: 5 SLM | |||
O<sub>2</sub> flow: 5 SLM | *N<sub>2</sub> flow: 0 SLM | ||
N<sub>2</sub> flow: 0 SLM | |||
The oxidation time is a variable command. | The oxidation time is a variable command, so it can be set by the user. | ||
The oxidation time can be changed, until the oxidation step is started. | |||
'''07 ANNEAL''' | '''07 ANNEAL''' | ||
''Message: " | ''Message: "Anneal/Dens"'' | ||
The O<sub>2</sub> gas is purged out of the furnace by an N<sub>2</sub> flow, so that the oxidation stop. | |||
The wafers are annealed in N<sub>2</sub> at the same temperature as the oxidation temperature. The annealing will improve the oxide quality by making it more dense. | |||
*N<sub>2</sub> flow: 6 SLM | |||
*O<sub>2</sub> flow: 0 SLM | |||
Normally the annealing time is 20 minutes, but it is a variable command, so it can be set by the user. | |||
The annealing time can be changed, until the annealing step is started. | |||
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''Message: "Unload wafers"'' | ''Message: "Unload wafers"'' | ||
The user | The recipe is paused, until the user presses "Start" (on the touch screen) or "Continue" (on the furnace computer). | ||
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''Message: "Unload wafers"'' | ''Message: "Unload wafers"'' | ||
When the furnace is open, the | When the furnace is open, the wafers can be unloaded. | ||
Place the boat on the quartz plate in front of the furnace to unload the wafers. And be aware of, that the wafers are very hot, so they have to cool down for a few minutes, before they are removed from the boat. | |||
When the wafers are unloaded, the user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace. | When the wafers are unloaded, the user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace. | ||
The recipe then jumps to the STANDBY step, and the user can leave the furnace, after it has closed | The recipe then jumps to the STANDBY step, and the user can leave the furnace, after it has closed. | ||