Jump to content

Specific Process Knowledge/Characterization/XRD: Difference between revisions

← Older edit
VisualWikitext
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,736 edits
 
(8 intermediate revisions by 2 users not shown)
Line 5: Line 5:


=XRD at DTU Nanolab=
=XRD at DTU Nanolab=
We have two X-ray diffraction setups in building 346:
We have three X-ray diffraction setups in building 346:
*The [[/XRD_SmartLab|XRD SmartLab]] primarily for thin film analysis inside the cleanroom.
*The [[/XRD_SmartLab|XRD SmartLab]] primarily for thin film analysis inside the cleanroom.
*The [[/XRD SmartLab 9kW Rotating Anode|XRD SmartLab 9kW Rotating Anode]] multipurpose system outside the cleanroom.
*The [[/XRD SmartLab 9kW Rotating Anode|XRD SmartLab 9kW Rotating Anode]] multipurpose system outside the cleanroom.
Line 11: Line 11:


==Experiments performed with XRD==
==Experiments performed with XRD==
*[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] Note mostly relevant for XRD Smartlab
*[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] Note mostly relevant for XRD Smartlab and XRD Rot Anode


==Data analysis==
==Data analysis==
Line 21: Line 21:
*[[/SLSII_analysis|Guide for using SmartLab Studio II for data analysis]]
*[[/SLSII_analysis|Guide for using SmartLab Studio II for data analysis]]
*[[/HighScore_analysis|Guide for using HighScore Plus for advanced powder data analysis]]
*[[/HighScore_analysis|Guide for using HighScore Plus for advanced powder data analysis]]
*[[/XRD_Reference_Data|How to download reference spectra for individual crystal structures]] (for DTU users and others with access to the ICSD).


Apart from this commercial software a wide range of free software is available online for data analysis. [https://xrd.mit.edu/xrd-software Here are some suggestions from MIT].
Apart from commercial software a wide range of free software is available online for data analysis. Please let us know if you find something you'd like to recommend!


==Comparison of the XRDs at Nanolab==
==Comparison of the XRDs at Nanolab==
Line 30: Line 31:
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab 9kW Rotating Anode</b>
|style="background:WhiteSmoke; color:black"|<b>XRD RotAnode</b>
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b>
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b>
|-
|-
Line 43: Line 44:
*Quality and degree of orientation
*Quality and degree of orientation
*3D orientation
*3D orientation
*Latice strain
*Lattice strain
*Composition
*Composition
*Twist
*Twist
Line 56: Line 57:
*Quality and degree of orientation
*Quality and degree of orientation
*3D orientation
*3D orientation
*Latice strain
*Lattice strain
*Composition
*Composition
*Twist
*Twist
Line 126: Line 127:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Scanning mode
Scanning mode
|style="background:WhiteSmoke; color:black"|
incident / receiver coupled or independent
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
incident / receiver coupled or independent
incident / receiver coupled or independent
Line 133: Line 136:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Goniomenter radius
Goniomenter radius
|style="background:WhiteSmoke; color:black"|
300 mm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
300 mm
300 mm
Line 140: Line 145:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Minimum step size
Minimum step size
|style="background:WhiteSmoke; color:black"|
0.0001° (0.36")
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.0001° (0.36")
0.0001° (0.36")
Line 147: Line 154:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Sample stage motion
Sample stage motion
|style="background:WhiteSmoke; color:black"|
*&chi;:-5~+95°
*&phi;:0~360°
*Z:-4~+1 mm
*X,Y:&plusmn;50 mm for a 100 mm wafer
*Rx,Ry:-5~+5°
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*&chi;:-5~+95°
*&chi;:-5~+95°
Line 162: Line 175:
*Cross Beam Optics(CBO)
*Cross Beam Optics(CBO)
*Ge(220)x2 monochromator
*Ge(220)x2 monochromator
*In-Plane Parallel Slit Collimator (PSC)
*Soller slit
*Automatic variable divergence slit
*Length limiting slits
|style="background:WhiteSmoke; color:black"|
*Cross Beam Optics(CBO)
*Ge(400)x2 monochromator
*In-Plane Parallel Slit Collimator (PSC)
*In-Plane Parallel Slit Collimator (PSC)
*Soller slit
*Soller slit
Line 178: Line 198:
*Parallel slit analysers (PSA)
*Parallel slit analysers (PSA)
*Ge(220)x2 analyser
*Ge(220)x2 analyser
|style="background:WhiteSmoke; color:black"|
*Automatic variable scattering slit
*Automatic variable receiver slit
*Parallel slit analysers (PSA)
*Ge(400)x2 analyser
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*0.04° soller slit
*0.04° soller slit
Line 184: Line 209:
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Measurement temperature
|style="background:LightGrey; color:black"|Measurement temperature
|style="background:WhiteSmoke; color:black"|
Room temperature
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Room temperature
Room temperature
Line 190: Line 217:
|-
|-
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
up to 150 mm wafers
Thickness max 21 mm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
up to 150 mm wafers
up to 150 mm wafers
Line 202: Line 233:


No powders or dusty materials.
No powders or dusty materials.
|style="background:WhiteSmoke; color:black"|
All materials have to be approved
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
All materials have to be approved
All materials have to be approved
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/XRD"