Jump to content

Specific Process Knowledge/Characterization/XRD: Difference between revisions

← Older edit
VisualWikitext
Khara (talk | contribs)
DCH-Employees-701, NLAB-LabmanagerAllUsers
277 edits
No edit summary
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,736 edits
 
(43 intermediate revisions by 4 users not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XRD click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XRD click here]'''


=XRD at Nanolab=
<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>
We have two X-ray diffraction setups in building 346:
 
*The [[/XRD_SmartLab|Rigaku SmartLab]] primarily for thin film analysis
 
*The [[/XRD_Powder|XRD Powder] for phase analysis of powders
=XRD at DTU Nanolab=
We have three X-ray diffraction setups in building 346:
*The [[/XRD_SmartLab|XRD SmartLab]] primarily for thin film analysis inside the cleanroom.
*The [[/XRD SmartLab 9kW Rotating Anode|XRD SmartLab 9kW Rotating Anode]] multipurpose system outside the cleanroom.
*The [[/XRD_Powder|XRD Powder]] for phase analysis of powders outside the cleanroom.
 
==Experiments performed with XRD==
*[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] Note mostly relevant for XRD Smartlab and XRD Rot Anode


==Data analysis==
==Data analysis==
For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis.
If more advanced powder analysis is needed we provide access to a remote desktop with a licence for the excellent Malvern Panalytical software, HighScore.
*[[/software|Installing SmartLab Studio II]]
*[[/dataconversion|Converting data from XRD Powder to SmartLab Studio II]]
*[[/SLSII_analysis|Guide for using SmartLab Studio II for data analysis]]
*[[/HighScore_analysis|Guide for using HighScore Plus for advanced powder data analysis]]
*[[/XRD_Reference_Data|How to download reference spectra for individual crystal structures]] (for DTU users and others with access to the ICSD).
Apart from commercial software a wide range of free software is available online for data analysis. Please let us know if you find something you'd like to recommend!


==Comparison of the XRDs at Nanolab==
==Comparison of the XRDs at Nanolab==
Line 14: Line 31:
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
|style="background:WhiteSmoke; color:black"|<b>XRD RotAnode</b>
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b>
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b>
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
|style="background:LightGrey; color:black"| Crystal structure analysis and thin film thickness measurement
|style="background:LightGrey; color:black"| Crystal structure analysis  
 
and thin film thickness measurement
|style="background:WhiteSmoke; color:black"|
*Phase ID
*Crystal Size
*Crystallinity
*Quality and degree of orientation
*3D orientation
*Lattice strain
*Composition
*Twist
*3D lattice constant
*Thickness
*Roughness
*Density
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Phase ID
*Phase ID
Line 24: Line 57:
*Quality and degree of orientation
*Quality and degree of orientation
*3D orientation
*3D orientation
*Latice strain
*Lattice strain
*Composition
*Composition
*Twist
*Twist
Line 41: Line 74:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
3 kW
3 kW
|style="background:WhiteSmoke; color:black"|
9 kW
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
600 W
600 W
Line 46: Line 81:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Rated tube voltage
Rated tube voltage
|style="background:WhiteSmoke; color:black"|
20 to 45 kV
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
20 to 45 kV
20 to 45 kV
Line 55: Line 92:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
2 to 60 mA
2 to 60 mA
|style="background:WhiteSmoke; color:black"|
2 to 200 mA
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
15 mA
15 mA
Line 62: Line 101:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Sealed tube
Sealed tube
|style="background:WhiteSmoke; color:black"|
Rotating Anode
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Sealed tube
Sealed tube
Line 67: Line 108:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Target
Target
|style="background:WhiteSmoke; color:black"|
Cu
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Cu
Cu
Line 76: Line 119:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.4 mm x 8 mm (Line/Point)
0.4 mm x 8 mm (Line/Point)
|style="background:WhiteSmoke; color:black"|
0.1-0.5 mm x 8 mm (Line/Point)
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.4 mm x 12 mm (Line)
0.4 mm x 12 mm (Line)
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Goniometer
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Goniometer
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Scanning mode
Scanning mode
|style="background:WhiteSmoke; color:black"|
incident / receiver coupled or independent
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
incident / receiver coupled or independent
incident / receiver coupled or independent
Line 89: Line 136:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Goniomenter radius
Goniomenter radius
|style="background:WhiteSmoke; color:black"|
300 mm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
300 mm
300 mm
Line 96: Line 145:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Minimum step size
Minimum step size
|style="background:WhiteSmoke; color:black"|
0.0001° (0.36")
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.0001° (0.36")
0.0001° (0.36")
Line 102: Line 153:
|-
|-
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Sample stage
Sample stage motion
|style="background:WhiteSmoke; color:black"|
*&chi;:-5~+95°
*&phi;:0~360°
*Z:-4~+1 mm
*X,Y:&plusmn;50 mm for a 100 mm wafer
*Rx,Ry:-5~+5°
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*&chi;:-5~+95°
*&chi;:-5~+95°
Line 111: Line 168:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Fixed with rotation
Fixed with rotation
|-
 
|style="background:LightGrey; color:black"|
Sample size
|style="background:WhiteSmoke; color:black"|
Diameter: 150 mm
Thickness: 0~21 mm
|style="background:WhiteSmoke; color:black"|
Powders
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Optics
Line 127: Line 177:
*In-Plane Parallel Slit Collimator (PSC)
*In-Plane Parallel Slit Collimator (PSC)
*Soller slit
*Soller slit
*Variable divergence slit
*Automatic variable divergence slit
*Length limiting slits
|style="background:WhiteSmoke; color:black"|
*Cross Beam Optics(CBO)
*Ge(400)x2 monochromator
*In-Plane Parallel Slit Collimator (PSC)
*Soller slit
*Automatic variable divergence slit
*Length limiting slits
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*0.04° soller slit
*0.04° soller slit
*Ni and Cu filter
*Ni and Cu filter
*Divergence slits
*Divergence slits
*Beam mask
*Beam masks
|-
|-
|style="background:LightGrey; color:black"|Receiver side
|style="background:LightGrey; color:black"|Receiver side
Line 140: Line 198:
*Parallel slit analysers (PSA)
*Parallel slit analysers (PSA)
*Ge(220)x2 analyser
*Ge(220)x2 analyser
|style="background:WhiteSmoke; color:black"|
*Automatic variable scattering slit
*Automatic variable receiver slit
*Parallel slit analysers (PSA)
*Ge(400)x2 analyser
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*0.04° soller slit
*0.04° soller slit
Line 146: Line 209:
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Measurement temperature
|style="background:LightGrey; color:black"|Measurement temperature
|style="background:WhiteSmoke; color:black"|
Room temperature
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Room temperature
Room temperature
Line 154: Line 219:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
up to 150 mm wafers
up to 150 mm wafers
Thickness max 21 mm
|style="background:WhiteSmoke; color:black"|
up to 150 mm wafers
Thickness max 21 mm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Only for powders
Only for powders
Line 159: Line 230:
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
All materials
All materials approved in the cleanroom.
 
No powders or dusty materials.
|style="background:WhiteSmoke; color:black"|
All materials have to be approved
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
All materials have to be approved
All materials have to be approved
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/XRD"