Specific Process Knowledge/Characterization: Difference between revisions

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 |  width="30" align="center" style="writing-mode: vertical-lr; transform: rotate(180deg);background:#f0f0f0;"|[[Specific_Process_Knowledge/Characterization/XPS|XPS]]
 |  width="30" align="center" style="writing-mode: vertical-lr; transform: rotate(180deg);background:#f0f0f0;"|[[Specific_Process_Knowledge/Characterization/PL_mapper|PL mapper]]
-|  width="30" align="center" style="writing-mode: vertical-lr; transform: rotate(180deg);background:#f0f0f0;"|[[Specific_Process_Knowledge/Characterization/4-Point_Probe|4-point probe]]
+|  width="30" align="center" style="writing-mode: vertical-lr; transform: rotate(180deg);background:#f0f0f0;"|[[Specific Process Knowledge/Characterization/Four-Point Probe|4-point probe]]
 |  width="30" align="center" style="writing-mode: vertical-lr; transform: rotate(180deg);background:#f0f0f0;"|[[Specific_Process_Knowledge/Characterization/Probe_station|Probe station]]
 |  width="30" align="center" style="writing-mode: vertical-lr; transform: rotate(180deg);background:#f0f0f0;"|[[Specific_Process_Knowledge/Characterization/XRD|XRD]]
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 |}
 <br clear="all">
-<br>
+<sup>{{fn|1}}</sup> Using the cross section method<br>
-<sup>fn_1</sup> Using the cross section method<br>
 <sup>{{fn|2}}</sup> Using the create step method<br>
 <sup>{{fn|3}}</sup> With known resistivity<br>
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 ===Electrical measurements===
-*[[/4-Point Probe|4-Point Probe]]
+*[[/Four-Point Probe|4-Point Probe]]
 *[[/Probe station|Probe station]]
 *[[/III-V ECV-profiler|III-V ECV-profiler (Electrochemical Capacitance-Voltage carrier density profiler)]]
@@ Line 174: / Line 170: @@
 ===SEMs at DTU Nanolab - building 307/314===
 <!-- *[[LabAdviser/CEN/Quanta 3D FIB/SEM|FIB-SEM FEI QUANTA 200 3D]] -->
-*[[LabAdviser/CEN/Helios Nanolab 600|Dual Beam FEI Helios Nanolab 600]]
+*[[LabAdviser/314/Microscopy 314-307/FIB/Helios|Dual Beam FEI Helios Nanolab 600]]
-*[[LabAdviser/CEN/Nova NanoSEM 600|SEM FEI Nova 600 NanoSEM]]
+*[[LabAdviser/314/Microscopy 314-307/SEM/Nova|SEM FEI Nova 600 NanoSEM]]
-*[[LabAdviser/CEN/Quanta FEG 200 ESEM|SEM FEI Quanta 200 ESEM FEG]]
+*[[
+LabAdviser/314/Microscopy 314-307/SEM/QFEG|SEM FEI Quanta 200 ESEM FEG]]
 <!-- *[[LabAdviser/CEN/Inspect S|SEM Inspect S]] -->
@@ Line 187: / Line 184: @@
 ===TEMs at DTU Nanolab - building 307/314===
-*[[LabAdviser/CEN/Titan ATEM |Titan ATEM]]
+*[[LabAdviser/314/Microscopy 314-307/TEM/ATEM |Titan ATEM]]
-*[[LabAdviser/CEN/Titan ETEM |Titan ETEM]]
+*[[LabAdviser/314/Microscopy 314-307/TEM/ETEM |Titan ETEM]]
-*[[LabAdviser/CEN/Tecnai TEM |Tecnai TEM]]
+*[[LabAdviser/314/Microscopy 314-307/TEM/T20 |Tecnai TEM]]
 ===XRD===
@@ Line 205: / Line 202: @@
 ==Decommissioned equipment==
 *[[/KLA-Tencor Surfscan 6420|KLA-Tencor Surfscan 6420]]
-*[[/X-Ray Diffractometer|Phillips X-Ray Diffractometer that was owned by DTU Fotonik]]
+*[[/X-Ray Diffractometer|Phillips X-Ray Diffractometer (owned by DTU Fotonik)]]