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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon_oxide click here]'''  
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=SiO2 etching in the ICP metal=
=SiO2 etching in the ICP metal=
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*Sample: s007592 ''by bghe@nanolab (2015-06-02)''
*Sample: s007592 ''by bghe@nanolab (2015-06-02)''
*See Martin Lind Ommen's results with hard masks in Process2share: [http://process2share.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_SiO2] <br> There were problems with polymer on the surface after etching.
*See Martin Lind Ommen's results with hard masks: [https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Etching_of_Silicon_Oxide#Dry_etch_with_Hard_mask] <br> There were problems with polymer on the surface after etching.
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