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Specific Process Knowledge/Thermal Process/Oxide mask: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxide_mask click here]'''
==Oxide mask thickness==
==Oxide mask thickness==
A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. I can also be used during a PECVD based diffusion process. The required oxide thickness differs between phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.
A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.
 
https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Boron-mask.png


[[File:phosphorous-mask.PNG|400px]]
https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Phosphorous-mask.png
[[File:boron-mask.PNG|400px]]
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