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Specific Process Knowledge/Wafer cleaning/Post CMP Cleaner: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/Post_CMP_Cleaner click here]'''
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/Post_CMP_Cleaner click here]'''


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== Post CMP Cleaner) ==
== Post CMP Cleaner) ==


[[image:Cmp_picture.jpg|400px|right|thumb|The Post CMP CLeaner in cleanroom A-5]]
[[image:post cmp cleaner.jpg|400px|right|thumb|The Post CMP CLeaner in cleanroom A-5]]


The post CMP Cleaner is designed for removing slurry residues from polishing wafers. After the Post CMP cleaner is the recommended cleaning tool after using the '''[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Back-end_processing/Polisher_CMP Polisher CMP]'''.
The post CMP Cleaner is designed for removing slurry residues from polishing wafers. The Post CMP cleaner is the recommended cleaning tool after using the '''[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Back-end_processing/Polisher_CMP Polisher CMP]'''.




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*Purpose 3 -->
*Purpose 3 -->
|-
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
 
|style="background:LightGrey; color:black"| 20x20mm substrate
|style="background:WhiteSmoke; color:black"|
*Removal rate: 400nm/min
*Thickness accuracy: +/- ? µm
*Thickness homogeneity: +/- ? µm
*Roughness: +/- ? µm
<!-- |style="background:WhiteSmoke; color:black"|
*Performance range 1
*Performance range 2
*Performance range 3 -->
|-
|style="background:LightGrey; color:black"|100mm substrate
|style="background:WhiteSmoke; color:black"|
*Removal rate: ~ 60 nm/min
*Thickness accuracy: ? µm
*Thickness homogeneity: ? µm
*Roughness: +/- ? µm
<!-- |style="background:WhiteSmoke; color:black"|
*Performance range -->
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range
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