Specific Process Knowledge/Thermal Process/Dope with Boron: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Dope_with_Boron click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Dope_with_Boron click here]''' | ||
=Doping with Boron= | |||
The Boron Drive-in and Pre-dep furnace (A1) can be used to pre-deposit/dope silicon wafers with boron. | The Boron Drive-in and Pre-dep furnace (A1) can be used to pre-deposit/dope silicon wafers with boron. | ||