Specific Process Knowledge/Lithography/DUVStepperLithography/DUVStepper: Difference between revisions
Created page with "==DUV Stepper== 300x300px|right|thumb|DUV Stepper is placed in F-3 '''Feedback to this section''': '''[mailto:labadviser@anolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#DUV_Stepper_FPA-3000EX4_from_Canon click here]''' The deep-UV stepper FPA-3000EX4 from Canon is an advanced exposure system designed for mass-production of 6 and..." |
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'''The user manual(s), quality control procedure(s) and results and contact information can be found | '''The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=273 LabManager]'''. | ||
===Process information=== | ===Process information=== | ||
*[[/Optimization and Simulation|Optimization and Simulation]] | *[[Specific_Process_Knowledge/Lithography/DUVStepperLithography/Optimization and Simulation|Optimization and Simulation]] | ||
*[[/Reticle Design|Reticle Design]] | *[[Specific_Process_Knowledge/Lithography/DUVStepperLithography/Reticle Design|Reticle Design]] | ||
*[[/Process Instructions|Process Instructions]] | *[[Specific_Process_Knowledge/Lithography/DUVStepperLithography/Process Instructions|Process Instructions]] | ||
===Equipment performance and process related parameters=== | ===Equipment performance and process related parameters=== | ||
{| border=" | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | ||
!style="background:silver; color:black;" width="60"|Purpose | |||
!style="background:silver; color:black; | |||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
|style="background:WhiteSmoke; color:black" colspan="2"| | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
| Line 30: | Line 27: | ||
|- | |- | ||
!style="background:silver; color:black | !style="background:silver; color:black" valign="center" rowspan="9"|Specifications | ||
|style="background:LightGrey; color:black"|Magnification | |style="background:LightGrey; color:black"|Magnification | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
1:5 | 1:5 | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Projection lens Numerical Aperture | |style="background:LightGrey; color:black"|Projection lens Numerical Aperture | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
0,4 - 0,60 | 0,4 - 0,60 | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Illumination system's σ | |style="background:LightGrey; color:black"|Illumination system's σ | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
0,2 - 0,75 (standard illumination mode: σ = 0,65) | 0,2 - 0,75 (standard illumination mode: σ = 0,65) | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Exposure source | |style="background:LightGrey; color:black"|Exposure source | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
KrF laser | KrF laser | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Wavelength | |style="background:LightGrey; color:black"|Wavelength | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
248nm | 248nm | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Illumination intensity | |style="background:LightGrey; color:black"|Illumination intensity | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
2800 W/m<sup>2</sup> | 2800 W/m<sup>2</sup> | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Illumination uniformity | |style="background:LightGrey; color:black"|Illumination uniformity | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
1,2% | 1,2% | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Maximum printed field size | |style="background:LightGrey; color:black"|Maximum printed field size | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
22 x 26 mm (maximum on wafer) | 22 x 26 mm (maximum on wafer) | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Alignment accuracy | |style="background:LightGrey; color:black"|Alignment accuracy | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
3 sigma = 50 nm | 3 sigma = 50 nm | ||
|- | |- | ||
!style="background:silver; color:black | !style="background:silver; color:black" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*100 mm wafers (in trays) | *100 mm wafers (in trays) | ||
*150 mm wafers | *150 mm wafers | ||
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|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*Any standard cleanroom material | *Any standard cleanroom material | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
1 - 25 | 1 - 25 | ||
|- | |- | ||
