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{{cc-nanolab}}
'''Feedback to this page:  
'''Feedback to this page:  
[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XPS/K-Alpha  click here]'''
[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XPS/K-Alpha  click here]'''
[[Category: Equipment |Characterization chemical]]
[[Category: Equipment |Characterization chemical]]
[[Category: Characterization|Chemical]]
[[Category: Characterization|Chemical]]
<!--Checked for updates on 4/4-2025 - ok/jmli -->


= The XPS K-Alpha =
== The XPS K-Alpha ==
 
Name: XPS K-Alpha <br>
Vendor: Thermofisher <br>
The XPS K-Alpha allows you to analyse a broad range of samples with the XPS technique.


'''The user manual(s), user APV(s), technical information and contact information are be found in LabManager:'''  
'''The user manual(s), user APV(s), technical information and contact information are be found in LabManager:'''  
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<!-- give the link to the equipment info page in LabManager: -->
<!-- give the link to the equipment info page in LabManager: -->
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276  XPS K-Alpha in LabManager]
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276  XPS K-Alpha in LabManager]
[[Image:XPS K-Alpha.jpg |thumb|x300px|The K-Alpha has its back turned towards the [[Specific Process Knowledge/Characterization/XPS/Nexsa | XPS Nexsa]] in room 904 in building 346.]]
==Process information==
The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page [[Specific Process Knowledge/Characterization/Element analysis|Element analysis]].
More about the different possibilities of the XPS instrument is found here:
*[[Specific Process Knowledge/Characterization/XPS/XPS technique|The XPS technique]]
*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental analysis]]
*[[Specific Process Knowledge/Characterization/XPS/XPS Chemical states |Chemical sensitivity]]
*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]]
*[[Specific Process Knowledge/Characterization/XPS/Carbon contamination|Carbon contamination]]
*[[Specific Process Knowledge/Characterization/XPS/ExtDocs | Links to external material ]]
== Getting access to the XPS ==
Click [[Specific Process Knowledge/Characterization/XPS/Access | '''HERE''' ]] to see information on how to get access to the XPS.
== Performance of XPS K-Alpha ==
{| border="2" cellspacing="0" cellpadding="1" |-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|Chemical analysis
|style="background:WhiteSmoke; color:black"|
* [[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Probing elemental composition]]
* [[Specific Process Knowledge/Characterization/XPS/XPS Chemical states |Chemical state identification]]
* Non destructive technique
* Surface sensitive
* [[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]] possible by ion beam etch of sample
|-
!rowspan="5" style="background:silver; color:black" align="left"| Performance
|style="background:LightGrey; color:black"|Spot size
|style="background:WhiteSmoke; color:black"|Can be set between 30µm - 400µm
|-
|style="background:LightGrey; color:black"|Probing depth
|style="background:WhiteSmoke; color:black"|Depending on probed element. Max probe depth lies within 10-200 Å.
|-
|style="background:LightGrey; color:black"|Resolution
|style="background:WhiteSmoke; color:black"|Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected.
|-
|style="background:LightGrey; color:black"|Charge compensation
|style="background:WhiteSmoke; color:black"|
Flood gun can be used for charge compensation of non conductive samples
|-
|style="background:LightGrey; color:black"|Finding structures
|style="background:WhiteSmoke; color:black"|Choose measuring spot from camera image (magnified)
|-
|-
|-
!rowspan="2" style="background:silver; color:black" align="left"|Depth profiling
|style="background:LightGrey; color:black"|Purpose
|style="background:WhiteSmoke; color:black"|With ion beam etch the top layer of the material can be removed, to do a depth profiling
|-
|style="background:LightGrey; color:black"|Ion beam size
|style="background:WhiteSmoke; color:black"| About 3x1 mm
|-
!rowspan="2" style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
Maximum 60x60 mm
|-
| style="background:LightGrey; color:black"|Substrate thickness
|style="background:WhiteSmoke; color:black"|
Maximum height about 20 mm
|-
|}
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