Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy  click here]'''
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-''This page is written by DTU Nanolab  internal''
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 =Scanning Electron Microscopy at Nanolab=
 There is a large range of scanning electron microscopes (SEMs) at DTU Nanolab. The first couple of sections on this page are about the SEMs in and around the fabrication part of Nanolab in building 346 and 451. The last section is about the SEMs in building 314, which is our dedicated characterization facility.
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 * The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2|SEM Supra 2]] and [[Specific_Process_Knowledge/Characterization/SEM_Supra_3|SEM Supra 3]] are located in the cleanroom where they serve as general imaging tools for samples that have been fabricated in the cleanroom. Like SEM Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2|SEM Supra 2]] is also equipped with an airlock and an EDX detector.
-* The [[Specific_Process_Knowledge/Characterization/SEM_Gemini_1|SEM Gemini 1]] is is a new SEM fra Carl Zeiss that is being installed in the cleanroom at the moment (August 2023)
+* The [[Specific_Process_Knowledge/Characterization/SEM_Gemini_1|SEM Gemini 1]] is a state-of-the-art SEM from Carl Zeiss that was installed in the cleanroom in the autumn of 2023. It has an impressive range of detectors and modes that are intended to be used for the most demanding samples.
 * The [[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1|SEM Tabletop 1]] is a tabletop SEM that is located in the basement outside the cleanroom. It has a limited resolution, but it is fast and easy to use, also for non-conducting samples. Training in the others SEMs is not required to use this SEM.
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 |style="background:WhiteSmoke; color:black" align="center"|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3|SEM Supra 3]]
 |style="background:WhiteSmoke; color:black" align="center"|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1|SEM Gemini 1]]
-<i>Under installation</i>
 |style="background:WhiteSmoke; color:black" align="center"|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1|SEM Tabletop 1]]
-<!--|style="background:WhiteSmoke; color:black" align="center"|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D|FEI Quanta 200 3D]]
+<!--|style="background:WhiteSmoke; color:black" align="center"|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D|FEI Quanta 200 3D]]-->
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 !colspan="2" border="none" style="background:silver; color:black;" align="center"|Model
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 * Thick polymers, glass or quartz samples
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+* Conducting samples
+* Semi-conducting samples
+* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
+* Thick polymers, glass or quartz samples
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 * Conducting samples
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 *Cleanroom of DTU Nanolab in building 346
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-*Cleanroom of DTU Nanolab
+*Cleanroom of DTU Nanolab in building 346
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 *Building 451 - room 913
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 * Secondary electron (Se2)
 * Inlens secondary electron (Inlens)
-*
+* Inlens backscatter electron (Inlens ESB)
+* Retractable, column mounted six segment backscatter electron (aBSD)
 * Variable pressure secondary electron (VPSE)
+* Retractable, four segment tranmitted electron (aSTEM)
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 * Secondary electron (Everhart-Thornley (ETD))
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 * Fixed at High vacuum (2 &times; 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
-* Variable at Low vacuum (0.1 mbar-2 mbar)
+* Variable at Low vacuum
+** Standard VP (variable pressure): 5-60 Pa
+** Nano VP, 350 um beamsleeve aperture: 5-150 Pa
+** Nano VP, 800 um beamsleeve aperture: 5-40 Pa
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 * Conductor vacuum mode: 5 Pa
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 * All software options available
+* Electron magnetic noise cancellations system
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 * Antivibration platform
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 * Antivibration platform
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+* Electron magnetic noise cancellations system
+* Zeiss airlock taking up to 6" wafers
+* Plasma cleaner
+* Sample bias option
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 |style="background:LightGrey; color:black" align="center" |Sample sizes
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 * Up to 6" wafer with full view
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 * Up to 8" wafer with 6" view
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-==Comparison of the SEMs at DTU Nanolab - building 307/314 [[image:Under_construction.png|50px]]==
+==Comparison of the SEMs at DTU Nanolab - building 307/314 ==
+Due to ongoing development of tools and processes, some information regarding available SEMs may be incomplete or not quite up-to-date.
 {{SEM comparison table 314}}