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'''Feedback to this page''': '''[mailto:Characterization@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Profiler click here]'''
to be deleted, info copied to pages with respective tool name


[[Category: Equipment|Characterization Profiler]]
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_XTA
[[Category: Characterization|Profiler]]


https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Tencor_P17


==Overview of the Nanolab profilers==
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Sensofar_S_Neox
All the profilers are compared on the [[Specific Process Knowledge/Characterization/Topographic measurement#Comparison_of_stylus_profilers.2C_optical_profilers_and_AFMs_at_Nanolab|topographic measurement]] page.


The sections below describe each profiler (Dektak stylus profilers and optical profilers) in more detail.
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Filmetrics


==Dektak XTA stylus profiler==
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_3ST


The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_150
 
A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow.
 
 
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:'''
 
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=304 Dektak XTA in LabManager]
 
 
===Equipment performance and process related parameters Dektak XTA===
 
[[image:Dektak XTA new.JPG|275x275px|right|thumb|Dektak XTA: positioned in cleanroom F-2.]]
 
{| border="2" cellspacing="0" cellpadding="10"
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|Profiler for measuring micro structures||style="background:WhiteSmoke; color:black"|
*Single line profiles
*Wafer mapping
*[[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] by measuring wafer bow
*Surface roughness on a line scan
|-
!style="background:silver; color:black" align="left" rowspan="6" valign="top" |Performance
|style="background:LightGrey; color:black"|Scan range x y
|style="background:WhiteSmoke; color:black"|
Line scan x: 50 µm to 55 mm in a single scan, up to 200 mm with stiching
|-
|style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
50 Å to 1 mm
|-
|style="background:LightGrey; color:black"|Resolution x y
|style="background:WhiteSmoke; color:black"|
Down to 0.003 µm
|-
|style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
1 Å, 10 Å, 80 Å or 160 Å (for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively)
|-
|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
|style="background:WhiteSmoke; color:black"|
~ 300 Å for the 65 kÅ range, ~ 0.17 µm for the intermediate ranges, and ~0.6 µm for the 1 mm range ([[#Height accuracy|see below]])
|-
|style="background:LightGrey; color:black"|Max scan depth as a function of trench width W
|style="background:WhiteSmoke; color:black"|
1.2*(W[µm]-5µm)
 
|-
!style="background:silver; color:black" align="left"|Hardware settings
|style="background:LightGrey; color:black"|Tip radius
|style="background:WhiteSmoke; color:black"|
*5 µm 45<sup>o</sup> cone
|-
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Up to 6"
|-
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}
 
===Height accuracy===
The accuracy of the height measurement with the profiler depends on the measurement settings as well as the instrument calibration, resolution, and measurement repeatability.
 
Both the force setting and the scan speed is important: Too high force may compress a soft material like Al or Au or some polymers, while too low force may mean that the stylus "jumps" over features, especially if the scan speed is high. However, if the scan speed is too low and you are measuring a small step <500 nm, you may experience drift in the measurement. Of course you also must make sure the feature you are measuring is wide enough for the stylus tip to reach the bottom (see the [http://labmanager.dtu.dk/d4Show.php?id=2346&mach=304 DektakXT manual], Figure 3 for details).
 
We calibrate the instrument with a step height calibration of 9160 Å for the 65 kÅ range and 24.865 µm for the larger ranges. The 95 % confidence intervals for the step height standards is 300 Å for the 9160 Å standard and 0.15 µm for the 24.865 µm standard.
 
Assuming ideal conditions, we can estimate the accuracy of a measurement based on the error of the calibration of the instrument combined with the error from the limits of the resolution and of the scatter of repeated measurements.
 
The error stemming from the uncertainty on the calibration standard is much larger than the other errors for all ranges except the 1 mm range. This means that the total uncertainty on a single measurement is mostly dominated by the calibration standard uncertainty, which leads to the 95 % confidence intervals listed above in the table: just over 30 nm for the smallest range, about 0.17 µm for the medium ranges, and about 0.6 µm for the 1 mm range, where the resolution uncertainty also contributes.
 
==Dektak 8 stylus profiler==
 
[[image:Dektak 8 new position.JPG|275x275px|right|thumb|Dektak 8: positioned in cleanroom  F-2.]]
 
Dektak 8 stylus profiler is a product of Veeco Instruments. It is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.
 
It can measure specific structures found with the help of a high magnification video camera or it can be programmed to measure several points defined with respect to some deskew points. It can also be used for [[Specific_Process_Knowledge/Characterization/Stress_measurement|stress measurements]] of thin films by measuring the wafer bow.
 
<br clear="all" />
 
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:'''
 
<!-- give the link to the equipment info page in LabManager: -->
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=123  Dektak 8 in LabManager]
 
The original user manual can be obtained from the staff.
 
===Equipment performance and process related parameters Dektak 8 stylus profiler===
 
{| border="2" cellspacing="0" cellpadding="10"
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|Profiler for measuring micro structures.||style="background:WhiteSmoke; color:black"|
*Single line profiles
*Wafer mapping
*[[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] by measuring wafer bow
*Surface roughness on a line scan
|-
!style="background:silver; color:black" align="left" rowspan="6" valign="top" |Performance
|style="background:LightGrey; color:black"|Scan range x y||style="background:WhiteSmoke; color:black"|
Line scan x: 50 µm to 100 mm
|-
|style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
50 Å to 1 mm
|-
|style="background:LightGrey; color:black"|Resolution x y
|style="background:WhiteSmoke; color:black"|
Down to 0.067 µm
|-
|style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
1 Å, 10 Å, 40 Å or 160 Å (for ranges 65 kÅ, 655 kÅ, 2620 kÅ and 1 mm respectively)
|-
|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
|style="background:WhiteSmoke; color:black"|
~ 300 Å for the 65 kÅ range, ~ 0.16 µm for the intermediate ranges, and ~0.6 µm for the 1 mm range ([[#Height measurement accuracy|see below]])
|-
|style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W
|style="background:WhiteSmoke; color:black"|
1.2*(W[µm]-5µm)
|-
|-
!style="background:silver; color:black" align="left"|Hardware settings
|style="background:LightGrey; color:black"|Tip radius
|style="background:WhiteSmoke; color:black"|
*5 µm, 45<sup>o</sup> cone
|-
!style="background:silver; color:black" align="left" rowspan="2" valign="top" |Performance
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Up to 8"
|-
| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}
 
=== Height measurement accuracy ===
[[#Height accuracy|See above for the DektakXTA]] as the considerations for the Dektak 8 are the same though the resolution and measurement repeatability is a tiny bit better for the Dektak 8 than for the DektakXTA.
 
==Optical Profiler (Sensofar)==
 
[[image:Optical_profiler_1.jpg|275x275px|right|thumb|Optical Profiler (Sensofar): positioned in the clean room F-2)]]
 
The PLu Neox 3D Optical Profiler (from Sensofar) has a dual-technology sensor head that combines confocal and interferometry techniques as well as thick and thin film measurement capabilities.
 
The Neox sensor head provides standard microscope imaging, confocal imaging, confocal profiling, PSI (Phase Shift Interferometry), VSI (Vertical Scanning Interferometry) and high resolution thin film thickness measurements on a single instrument.
 
The main purpose is 3D topographic imaging of surfaces, step height measurements in smaller trenches/holes than can be obtained with standard stylus methods (i.e. with aspect ratios higher that 1:1), roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
 
For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
 
The resolution is limited by the objectives and the pixel resolution. Also the depth of focus is limited, especially for higher magnifications.
 
 
'''The user manual, technical information and contact information can be found in LabManager:'''
 
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=301 Optical profiler (Sensofar) info page in LabManager]
 
 
===Process Information===
*[[/Optical Profiler (Sensofar) acceptance test|Results from the Optical Profiler (Sensofar) acceptance test]]
*[[Media:Plu neox 2010.pdf| Sensofar presentation on how the sensofar works]]
*[[Media:PLu neox.pdf| Plu neox leaflet including specifications]]
 
===Equipment performance and process related parameters===
 
{| border="2" cellspacing="0" cellpadding="10"
 
!colspan="2" border="none" style="background:silver; color:black;" align="center"|<b>Equipment</b>
|style="background:WhiteSmoke; color:black"|<b>Optical profiler</b>
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|3D topographic imaging of surfaces.||style="background:WhiteSmoke; color:black"|
*3D imaging of surfaces
*Roughness measurements
*Step height measurements
*3D topographic measurements
*Thick and thin film thickness measurements in small spots (down to 4 µm)
|-
!style="background:silver; color:black;" align="left"|Posibilities
|style="background:LightGrey; color:black"|Confocal and interferometric profiling and reflectometry||style="background:WhiteSmoke; color:black"|
*Standard microscope imaging
*Confocal imaging
*Confocal profiling
*PSI (Phase Shift Interferometry)
*VSI (Vertical Scanning Interferometry)
*High resolution thin film thickness measurement using reflectrometry
*Stitched scans
*Wafer mapping
|-
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|Depending on the objective chosen||style="background:WhiteSmoke; color:black"|
*See the performance of the different objectives here: [[image:Optical_Profiler_Table_2.jpg|27x27px|center|thumb]]
|-
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Substrates no bigger than 150 mm x 150mm
|-
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}
 
 
==Optical Profiler (Filmetrics)==
 
[[image:Scanner without anotation.jpg|275x275px|right|thumb|Optical Profiler (Filmetrics): positioned in the basement (346-904)]]
 
The Profilm3D optical profiler from Filmetrics uses white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images.
 
The main purpose is 3D topographic imaging of surfaces, step height measurements and roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
 
For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
 
The resolution is limited by the objective and the sampling resolution.
 
 
'''The user manual, technical information and contact information can be found in LabManager:'''
 
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=467 Optical profiler (Filmetrics) info page in LabManager]
 
 
 
===Equipment performance and process related parameters===
 
{| border="2" cellspacing="0" cellpadding="10"
 
!colspan="2" border="none" style="background:silver; color:black;" align="center"|<b>Equipment</b>
|style="background:WhiteSmoke; color:black"|<b>Optical profiler</b>
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|3D topographic imaging of surfaces.||style="background:WhiteSmoke; color:black"|
*3D imaging of surfaces
*Roughness measurements
*Step height measurements
*3D topographic measurements
|-
!style="background:silver; color:black;" align="left"|Posibilities
|style="background:LightGrey; color:black"|Interferometric profiling||style="background:WhiteSmoke; color:black"|
*Standard microscope imaging
*PSI (Phase Shift Interferometry)
*WLI (White light Interferometry)
*Stitched scans
*Wafer mapping
|-
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|With the current 10x objective||style="background:WhiteSmoke; color:black"|
[[:File:Filmetrics Datasheet - Profilm3D Bh6.pdf|See here the data sheet for this instrument]]
|-
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Substrates no bigger than 100 mm x 100mm
|-
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}
 
== Dektak 3ST ==
 
 
[[image:III-V profiler.JPG|300x300px|right|thumb|The profiler placed in 346-904 (Dektak 3ST).]]
 
The Dektak 3ST is intended for profile measurements on samples outside the cleanroom.
 
 
'''The user manual, technical information and contact information can be found in LabManager:'''
 
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=184 Dektak 3ST (Dektak) in LabManager]
 
The computer connected to the Dektak 3ST is pretty old and runs Windows 98 SE. It is not connected to the network but traces can be saved on either USB memory stick or floppy disk. The USB driver is an old universal driver and has been shown to work with small size USB sticks. However it did not work with an 8GB Kingston stick.
 
===Equipment performance and process related parameters===
{| border="2" cellspacing="0" cellpadding="10"
|-
!style="background:silver; color:black" align="left" rowspan="4" valign="top" |Performance
|style="background:LightGrey; color:black"|Vertical Range
|style="background:WhiteSmoke; color:black"|
*65 kÅ, 655 kÅ, 1310 kÅ
|-
|style="background:LightGrey; color:black"|Scan length range
|style="background:WhiteSmoke; color:black"|
*50-50000 µm
|-
|style="background:LightGrey; color:black"|Stylus track force
|style="background:WhiteSmoke; color:black"|
*Recommended: 3-10 mg, depending on the softness of the surface
|-
|style="background:LightGrey; color:black"|Scan speed ranges
|style="background:WhiteSmoke; color:black"|
*High speed: 3s for 50µm to 50000µm
*Medium speed: 12s for 50µm to 10000µm
*Low speed: 50s
|-
!style="background:silver; color:black" align="left" rowspan="1" valign="top" |Materials
|style="background:LightGrey; color:black"|Allowed substrate materials
|style="background:WhiteSmoke; color:black"|
*III-V
* Silicon
* polymer
|}
 
 
 
 
 
 
== Stylus Profiler: Dektak150 ==
 
 
[[image:Dektak150.JPG|300x300px|right|thumb|Stylus profiler:Dektak150 placed in 347-183.]]
 
The stylus profiler Dektak150 is intended for profile measurements on samples outside the cleanroom.
 
 
'''The user manual, technical information and contact information can be found in LabManager:'''
 
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=457  Stylus profiler:Dektak150 in LabManager]
 
The computer is not connected to the network but data can be saved on a dedicated USB and transfered to a computer on the network.
 
===Equipment performance and process related parameters===
 
{| border="2" cellspacing="0" cellpadding="10"
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|Profiler for measuring micro structures||style="background:WhiteSmoke; color:black"|
*Single line profiles
*Surface roughness on a line scan
|-
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Performance
|style="background:LightGrey; color:black"|Scan range x y
|style="background:WhiteSmoke; color:black"|
Line scan x: 50 µm to 55 mm in a single scan
|-
|style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
50 Å to 1 mm
|-
|style="background:LightGrey; color:black"|Resolution x y
|style="background:WhiteSmoke; color:black"|
Down to 0.003µm
|-
|style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
1Å (@65kÅ), 10Å (@655 kÅ), 80 Å (@5240 kÅ), 160 Å (@1mm)
|-
|style="background:LightGrey; color:black"|Maximum sample thickness
|style="background:WhiteSmoke; color:black"|
100mm
|-
|-
!style="background:silver; color:black" align="left"|Hardware settings
|style="background:LightGrey; color:black"|Tip radius
|style="background:WhiteSmoke; color:black"|
*5 µm 45<sup>o</sup> cone
*0.2 µm 45<sup>o</sup> cone on request
|-
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Up to 6"
|-
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}

Latest revision as of 20:52, 27 May 2025

to be deleted, info copied to pages with respective tool name

https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_XTA

https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Tencor_P17

https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Sensofar_S_Neox

https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Filmetrics

https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_3ST

https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_150

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