Specific Process Knowledge/Characterization/Probe station: Difference between revisions
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==Probe | {{cc-nanolab}} | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe_station click here]''' | |||
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=Probe Station= | |||
[[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]] | [[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]] | ||
The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips. | |||
Samples can be inspected by either a microscope and/or a camera. | |||
Two Keithley 2450 source meters are connected to the probe station by triax cables. An additional Keithley 2410 source meter and a Keithley 2000 multi meter is connected by coax cables. All Keithleys can also be connected with banana wires. | |||
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The user manual, technical information and contact information can be found in | |||
[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=343 '''Labmanager]'''. | |||
==Performance and Process Parameters== | |||
{| border="2" cellspacing="2" cellpadding="3" | {| border="2" cellspacing="2" cellpadding="3" | ||
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*I/V | *I/V | ||
*Resistance | *Resistance | ||
*Data collection by PC | *Data collection by PC possible | ||
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