Jump to content

Specific Process Knowledge/Characterization/Probe station: Difference between revisions

← Older edit
VisualWikitext
Rkch (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
283 edits
Mmat (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, Administrators
1,954 edits
 
(20 intermediate revisions by 3 users not shown)
Line 1: Line 1:
==Probe Station==
{{cc-nanolab}}


'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe_Station click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe_station click here]'''
<br>
<br>
=Probe Station=
[[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]]


==Thickness measurer==
The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips.
[[Image:Thicknessmeasurer2007.jpg|thumb|300x300px|Thickness Measurer. Positioned in cleanroom D-3]]


The purpose is to measure the thickness of wafers, depths of larger grooves or height of larger mesas.  
Samples can be inspected by either a microscope and/or a camera.


During a KOH etch it can be helpful to ensure no over-etching by making a thickness measurement during the etching.  
Two Keithley 2450 source meters are connected to the probe station by triax cables. An additional Keithley 2410 source meter and a Keithley 2000 multi meter is connected by coax cables. All Keithleys can also be connected with banana wires.




'''The user manual, technical information and contact information can be found in LabManager:'''
The user manual, technical information and contact information can be found in  
[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=343 '''Labmanager]'''.


'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=198 Thickness measurer]'''


==Quality Control - Recipe Parameters and Limits==
==Performance and Process Parameters==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for the Thickness measurer'''
|-
|
The measured standard thickness is 0.1 mm. The measured result has to be within &plusmn; 0.005 mm. The QC is preformed once a year.
*[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=1831&mach=198 The QC procedure]<br>
*[http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=2062 The newest QC data]<br>
|}
 
 
==Equipment performance and process related parameters==


{| border="2" cellspacing="2" cellpadding="3"  
{| border="2" cellspacing="2" cellpadding="3"  
Line 34: Line 26:
Purpose  
Purpose  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Thickness measurer
Electrical measurements
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Wafer thickness
*I/V
*Depths of larger grooves
*Resistance
*Heigth of larger mesas
*Data collection by PC possible
|-
|-
!style="background:silver; color:black" align="center"|
!style="background:silver; color:black" align="center"|
Performance
Performance
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
Thickness resolution
Pad size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*< 5 µm
*100x100µm or more
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|
Line 59: Line 51:
|-  
|-  
|}
|}
The Probe station is a - EPS150Triax - Cascade for I/V measurement, ohmic measurements etc, it has 4 individually adjustable probes, but can be fitted with more. It has several source meters, multi meters and a computer attached. 
It can be used from pieces up to 6" wafers
[[Image:probestation.jpg|thumb|300x300px|Probe station: positioned in Service room CX1]]
'''The user manual, technical information and contact information can be found in LabManager:'''
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=343 Probe station]'''
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Probe_station"