Specific Process Knowledge/Characterization/Probe station: Difference between revisions

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-==Probe Station==
+{{cc-nanolab}}
-'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe Station click here]'''
+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe_station click here]'''
+<br>
+<br>
+=Probe Station=
+[[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]]
+The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips.
-The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.
+Samples can be inspected by either a microscope and/or a camera.
-The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.
+Two Keithley 2450 source meters are connected to the probe station by triax cables. An additional Keithley 2410 source meter and a Keithley 2000 multi meter is connected by coax cables. All Keithleys can also be connected with banana wires.
-[[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in cleanroom D-3]]
-'''The user manual, technical information and contact information can be found in LabManager:'''
-'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=163 Four point probe]'''
+The user manual, technical information and contact information can be found in
+[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=343 '''Labmanager]'''.
+==Performance and Process Parameters==
+{| border="2" cellspacing="2" cellpadding="3"
+|-
+!style="background:silver; color:black;" align="center"|
+Purpose
+|style="background:LightGrey; color:black"|
+Electrical measurements
+|style="background:WhiteSmoke; color:black"|
+*I/V
+*Resistance
+*Data collection by PC possible
+|-
+!style="background:silver; color:black" align="center"|
+Performance
+|style="background:LightGrey; color:black"|
+Pad size
+|style="background:WhiteSmoke; color:black"|
+*100x100µm or more
+|-
+!style="background:silver; color:black" align="center" valign="center" rowspan="2"|
+Substrates
+|style="background:LightGrey; color:black"|
+Batch size
+|style="background:WhiteSmoke; color:black"|
+*One sample
+|-
+| style="background:LightGrey; color:black"|Substrate materials allowed
+|style="background:WhiteSmoke; color:black"|
+*No restrictions
+|-
+|}