Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420: Difference between revisions
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'''Feedback to this page''': '''[mailto:characterization@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/KLA-Tencor_Surfscan_6420&action=edit&redlink=1 click here]''' | '''Feedback to this page''': '''[mailto:characterization@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/KLA-Tencor_Surfscan_6420&action=edit&redlink=1 click here]''' | ||
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== KLA-Tencor Surfscan 6420 | '''<p style="color:red;">The KLA-Tencor Surfscan 6420 has has been decommisioned in April 2023 and replaced with the [[Specific_Process_Knowledge/Characterization/Particle_Scanner_Takano|Particle Scanner Takano]]. </p>''' | ||
= KLA-Tencor Surfscan 6420 = | |||
[[image:Surfscan_at_FAT.JPG|300x300px|right|thumb|The KLA-Tencor Surfscan (at the place in California where it was refurbished).]] | [[image:Surfscan_at_FAT.JPG|300x300px|right|thumb|The KLA-Tencor Surfscan (at the place in California where it was refurbished).]] | ||
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'''[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=318 Surfscan 6420]''' | '''[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=318 Surfscan 6420]''' | ||
== | == Acceptance Test== | ||
We have two calibration wafers for the KLA-Tencor Surfscan. The calibration wafers are 6" silicon wafers with a number of polystyrene latex spheres (PLS) uniformily spread over the surface. Those wafers have been used for the acceptance test. The mean diameter and number PLS's on each wafer are certified. | |||
'''Calibration wafer 1:''' | |||
* PLS mean diameter: 0.204 µm +/- 0.008 µm | |||
* Number of PLS's: 7234 +/- 10% | |||
'''Calibration wafer 2:''' | |||
* PLS mean diameter: 1.112 µm +/- 0.018 µm | |||
* Number of PLS's: 7700 +/- 10% | |||
'''Calibration wafer 3:''' | |||
* PLS mean diameter: 4.000 µm +/- 0.043 µm | |||
* Number of PLS's: 7587 +/- 10% | |||
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===Repeatability check=== | |||
'''Acceptance criterion:''' 10 scans are done on each of the three PLS calibration wafers. The wafers are loaded/unloaded to the cassette every time. The repeatbility of +/- 1σ has to be less than 1%. | |||
'''Results:'''<br> | |||
'''Calibration wafer 1''': | |||
*Measured average PLS diameter: 0.2063 µm. Repeatability: 0,24% | |||
*Average number of PLS's: 7065. Repeatability: 0.11% | |||
'''Calibration wafer 2''': | |||
*Measured average PLS diameter: 1.100 µm. Repeatability: 0% | |||
*Average number of PLS's: 7427. Repeatability: 0.20% | |||
'''Calibration wafer 3''': | |||
*Measured average PLS diameter: 3.970 µm. Repeatability: 0,24% | |||
*Average number of PLS's: 7101. Repeatability: 0.10% | |||
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===Uniformity check=== | |||
'''Acceptance criterion:'''Measure the average PLS diameter by boxing an area in five different locations on a PLS wafer. The measurement has to be within 3%. | |||
'''Results:'''<br> | |||
'''Calibration wafer 2''': | |||
*Non-uniformity: 1,36% | |||
'''Calibration wafer 3''': | |||
*Non-uniformity: 0.38% | |||
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===Handling test=== | |||
'''Acceptance criterion:''' Run a cassette of 25 wafers. The machine should be able to error-free handle the cassette 40 times, i.e. it should be able to handle 1000 wafers without failing. | |||
'''Results:'''<br> | |||
'''6" cassette"''': A cassette of 25 wafers was handled 40 times over night, i.e. the acceptance criterion was meet. | |||
'''4" and 8" cassette''': A cassette of 25 wafers was handled two times. The scanning was then stopped to save time as handling of more cassettes is not expected to cause problems. | |||
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== | ==Process Parameters== | ||
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